Abstract: The durability of a transparent pyrolytic spray applied coating is improved by providing a spray solution of metal acetylacetonates having different particle size distribution. More particularly, the particle size distribution of each of the metal acetylacetonates is a function of its melting temperature, and optionally of its melting temperature and solubility.

Abstract: The durability of a transparent pyrolytic spray applied coating is improved by providing a spray solution of metal acetylacetonates having different particle size distribution. More particularly, the particle size distribution of each of the metal acetylacetonates is a function of its melting temperature, and optionally of its melting temperature and solubility.

Abstract: A coated substrate is disclosed. The coated substrate includes a substrate; an undercoating having one or more materials selected from tin oxide, silica, titania, alumina, zirconia, zinc oxide and alloys and mixtures thereof nitrides of titanium, zirconium, hafnium, silicon, aluminum and mixtures thereof, and oxy-nitrides of titanium, zirconium, hafnium, silicon, aluminum and mixtures thereof overlaying at least a portion of the substrate; and a functional coating overlaying at least a portion of the undercoating. As a result of the undercoating, the coated substrate can exhibit improved properties such as improved aesthetic properties, increased durability, photocatalytic activity, mechanical durability, etc.

Abstract: Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sup.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds.

Abstract: A method for coating a moving substrate provides a coating having a chemical composition which varies continuously from the interface with the substrate to the opposite surface of the coating. The method involves directing a vapor coating composition toward a substrate surface and moving portions of the vapor in opposite directions. A vapor coating mixture may include a tin-containing precursor and a silicon-containing precursor. An accelerant, e.g. a phosphorus-containing precursor, may be used with the metal-containing precursors to increase the deposition rate of the coating. The coating deposited on the substrate has regions of continuously varying weight percent of silicon oxide and tin oxide as the distance from the substrate-coating interface increases, with the surface of the coating farthest from the substrate-coating interface being predominantly tin oxide.

Abstract: An apparatus for coating a glass ribbon has an exhaust on each side of a coating unit at different distances therefrom. With this arrangement, portions of the ribbon upstream and downstream of the coating unit are exposed to coating vapors from the coating unit for different periods of time. A coating mixture includes tin containing precursors and a silicon containing precursor. The silicon containing precursor has the structural formula ##STR1## where R.sub.1 is a group which does not have an oxygen available to form a peroxide, R.sub.2 is a functional group giving the silicon containing precursor the ability to be easily converted to silicon oxide coating, R.sub.3 is a bridging group to provide for multiple silicon atoms and R.sub.4 completes the bonding on the foundation silicon atom. An accelerant e.g. a phosphorus containing precursor may be used with the metal containing precursors to increase the deposition rate of the coating.