Patents by Inventor Patricia Vreugdewater

Patricia Vreugdewater has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7742149
    Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: June 22, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Youssef Karel Maria De Vos, Ronald Casper Kunst, Patricia Vreugdewater, Peter Paul Hempenius
  • Publication number: 20080309911
    Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 18, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Youssef Karel Maria De Vos, Ronald Casper Kunst, Patricia Vreugdewater, Peter Paul Hempenius
  • Patent number: 7245047
    Abstract: A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.
    Type: Grant
    Filed: April 29, 2004
    Date of Patent: July 17, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Patricia Vreugdewater, Henrikus Herman Marie Cox, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot
  • Patent number: 7224429
    Abstract: A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At least one of the actuators includes a shield configured to shield the actuator from a field generated by the other actuator. In this manner, a disturbance force due to the field is prevented to act on the shielded actuator. The invention also includes a positioning system including such actuators.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: May 29, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Edwin Johan Buis, Patricia Vreugdewater
  • Patent number: 7161267
    Abstract: A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: January 9, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Johan Cornelis Compter, Erik Roelof Loopstra, Patricia Vreugdewater
  • Patent number: 7145269
    Abstract: A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric current carried by the electrically conductive element and a resulting field of the first and second magnetic field generated by the main and subsidiary magnet system, respectively. The actuator further comprises a magnetic element extending substantially between outer sides of the first and second magnet system subassemblies. The magnetic element guides a portion of the second, subsidiary field between the first and second magnet system subassemblies.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: December 5, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Henrikus Herman Marie Cox, Hernes Jacobs, Patricia Vreugdewater, Koen Jacobus Johannes Marie Zaal
  • Patent number: 7095485
    Abstract: A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: August 22, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Johan Cornelis Compter, Erik Roelof Loopstra, Patricia Vreugdewater
  • Patent number: 7088428
    Abstract: Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: August 8, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Edwin Johan Buis, Harmen Klaas Van Der Schoot, Patricia Vreugdewater
  • Patent number: 7079226
    Abstract: The present invention relates to a Lorentz actuator in the context of a lithographic projection apparatus. The present invention improves the thermal performance of a Lorentz actuator over the prior art by employing a plurality of coils, separated by separation layers of high thermal conductivity material in good thermal contact with a cooling element. In this way, heat flows more quickly from hotspot regions near the center of the coils into the cooling element. According to an embodiment of the invention, the cooling element is arranged to be in line with the separation layers so as to optimize the thermal connection between these two members. It is found that splitting a parent coil into two coils provides a practical balance between improved thermal performance and undesirable increases in volume and complexity.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: July 18, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Patricia Vreugdewater, Sven Antoin Johan Hol, Henrikus Herman Marie Cox
  • Patent number: 7005823
    Abstract: A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a function of the control current and the actuator gain, the actuator including a magnet configured to induce a magnetic field; and a coil arranged in the magnetic field, the magnet and the coil being movable relative to each other. The system also includes a power supply configured to supply the control current to the actuator in response to a control signal; and a control system configured to control the force generated by the actuator by supplying the control signal to the power supply, the control signal being adapted to the actuator gain, the gain being predetermined as a function of a parameter.
    Type: Grant
    Filed: October 21, 2004
    Date of Patent: February 28, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Martijn Houkes, Henrikus Herman Marie Cox, Ramidin Izair Kamidin, Patricia Vreugdewater
  • Publication number: 20050200208
    Abstract: A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric current carried by the electrically conductive element and a resulting field of the first and second magnetic field generated by the main and subsidiary magnet system, respectively. The actuator further comprises a magnetic element extending substantially between outer sides of the first and second magnet system subassemblies. The magnetic element guides a portion of the second, subsidiary field between the first and second magnet system subassemblies.
    Type: Application
    Filed: March 10, 2004
    Publication date: September 15, 2005
    Applicant: ASML, Netherlands B.V.
    Inventors: Sven Johan Hol, Henrikus Marie Cox, Hernes Jacobs, Patricia Vreugdewater, Koen Marie Zaal
  • Publication number: 20050146698
    Abstract: A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At least one of the actuators includes a shield configured to shield the actuator from a field generated by the other actuator. In this manner, a disturbance force due to the field is prevented to act on the shielded actuator. The invention also includes a positioning system including such actuators.
    Type: Application
    Filed: October 15, 2004
    Publication date: July 7, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Sven Hol, Edwin Buis, Patricia Vreugdewater
  • Publication number: 20050140326
    Abstract: A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a function of the control current and the actuator gain, the actuator including a magnet configured to induce a magnetic field; and a coil arranged in the magnetic field, the magnet and the coil being movable relative to each other. The system also includes a power supply configured to supply the control current to the actuator in response to a control signal; and a control system configured to control the force generated by the actuator by supplying the control signal to the power supply, the control signal being adapted to the actuator gain, the gain being predetermined as a function of a parameter.
    Type: Application
    Filed: October 21, 2004
    Publication date: June 30, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martijn Houkes, Henrikus Cox, Ramidin Kamidin, Patricia Vreugdewater
  • Publication number: 20050061626
    Abstract: A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.
    Type: Application
    Filed: May 28, 2004
    Publication date: March 24, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Sven Hol, Johan Compter, Erik Loopstra, Patricia Vreugdewater
  • Publication number: 20040263000
    Abstract: A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.
    Type: Application
    Filed: April 29, 2004
    Publication date: December 30, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricia Vreugdewater, Henrikus Herman Marie Cox, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot
  • Publication number: 20040246458
    Abstract: A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.
    Type: Application
    Filed: March 11, 2004
    Publication date: December 9, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Johan Cornelis Compter, Erik Roelof Loopstra, Patricia Vreugdewater
  • Publication number: 20040218166
    Abstract: The present invention relates to a Lorentz actuator in the context of a lithographic projection apparatus. The present invention improves the thermal performance of a Lorentz actuator over the prior art by employing a plurality of coils, separated by separation layers of high thermal conductivity material in good thermal contact with a cooling element. In this way, heat flows more quickly from hotspot regions near the center of the coils into the cooling element. According to an embodiment of the invention, the cooling element is arranged to be in line with the separation layers so as to optimize the thermal connection between these two members. It is found that splitting a parent coil into two coils provides a practical balance between improved thermal performance and undesirable increases in volume and complexity.
    Type: Application
    Filed: March 11, 2004
    Publication date: November 4, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Patricia Vreugdewater, Sven Antoin Johan Hol, Henrikus Herman Marie Cox
  • Publication number: 20040218167
    Abstract: Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.
    Type: Application
    Filed: March 11, 2004
    Publication date: November 4, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Sven Antoin Johan Hol, Edwin Johan Buijs, Harmen Klaas Van Der Schoot, Patricia Vreugdewater