Patents by Inventor Patricius Aloysius Jacobus Tinnemans
Patricius Aloysius Jacobus Tinnemans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110090473Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.Type: ApplicationFiled: December 22, 2010Publication date: April 21, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
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Publication number: 20110043778Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.Type: ApplicationFiled: October 29, 2010Publication date: February 24, 2011Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Johannes Jacobus Matheus Baselmans
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Patent number: 7868998Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.Type: GrantFiled: June 30, 2008Date of Patent: January 11, 2011Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
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Patent number: 7864295Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.Type: GrantFiled: July 2, 2008Date of Patent: January 4, 2011Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Johannes Jacobus Matheus Baselmans
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Publication number: 20100321650Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: August 26, 2010Publication date: December 23, 2010Applicant: ASML NETHERLANDS B.V.Inventors: THEODORUS PETRUS MARIA CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7830493Abstract: A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.Type: GrantFiled: October 25, 2005Date of Patent: November 9, 2010Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Willem Jurrianus Venema, Koen Jacobus Johannes Maria Zaal
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Patent number: 7826672Abstract: A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.Type: GrantFiled: September 4, 2009Date of Patent: November 2, 2010Assignee: ASML Netherlands B.V.Inventors: Lambertus Gerardus Maria Kessels, Patricius Aloysius Jacobus Tinnemans, Remco Johannes Van Engelen
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Publication number: 20100270709Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.Type: ApplicationFiled: July 14, 2010Publication date: October 28, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria MERTENS, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
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Patent number: 7804575Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: GrantFiled: August 17, 2005Date of Patent: September 28, 2010Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7779781Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.Type: GrantFiled: July 28, 2004Date of Patent: August 24, 2010Assignee: ASML Netherlands B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
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Patent number: 7751032Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.Type: GrantFiled: June 16, 2008Date of Patent: July 6, 2010Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan-Gerard Cornelis Van Der Toorn
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Patent number: 7738077Abstract: A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to patterned the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g., semiconductor substrate or flat panel display substrate) or a display device.Type: GrantFiled: July 31, 2006Date of Patent: June 15, 2010Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Patricius Aloysius Jacobus Tinnemans
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Publication number: 20090324111Abstract: A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.Type: ApplicationFiled: September 4, 2009Publication date: December 31, 2009Applicant: ASML Netherlands B.V.Inventors: Lambertus Gerardus Maria KESSELS, Patricius Aloysius Jacobus Tinnemans, Remco Johannes Van Engelen
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Publication number: 20090279066Abstract: A lithographic apparatus is disclosed that includes an illumination system configured to condition a beam of radiation, the illumination system having a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the radiation beam.Type: ApplicationFiled: May 6, 2009Publication date: November 12, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Patricius Aloysius, Jacobus TINNEMANS, Johannes Jacobus, Matheus BASELMANS
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Patent number: 7606430Abstract: A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation.Type: GrantFiled: August 30, 2005Date of Patent: October 20, 2009Assignee: ASML Netherlands B.V.Inventors: Lambertus Gerardus Maria Kessels, Patricius Aloysius Jacobus Tinnemans, Remco Johannes Van Engelen
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Publication number: 20090244506Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.Type: ApplicationFiled: December 22, 2008Publication date: October 1, 2009Applicant: ASML Netherlands B.VInventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
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Publication number: 20090190197Abstract: A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.Type: ApplicationFiled: December 19, 2008Publication date: July 30, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Heine Melle Mulder, Marius Ravensbergen, Wilfred Edward Endendijk, Jozef Ferdinand Dymphna Verbeeck
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Publication number: 20090115984Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.Type: ApplicationFiled: January 7, 2009Publication date: May 7, 2009Applicant: ASML NETHERLANDS B.V.Inventors: HANS JANSEN, PATRICIUS ALOYSIUS JACOBUS TINNEMANS, JAN-GERARD CORNELIS VAN DER TOORN
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Patent number: 7508220Abstract: An assembly for capacitively detecting an object on a support structure includes at least one electrode being arranged in the vicinity of the support structure, and at least one cable being connected to the at least one electrode. The at least one cable has a first conductor and a second conductor. The first conductor is connected to a series connection of a DC source and a first AC source. A control device is arranged to control the DC source to provide a predetermined DC voltage to the at least one electrode to provide a clamping force on the object, and control the first AC source to provide a predetermined first AC voltage with a first amplitude and a first phase via the first conductor to the at least one electrode for capacitively detecting the object. The assembly includes a second AC source connected to the second conductor and the control device is arranged to control the second AC source to provide a predetermined second AC voltage to the second conductor.Type: GrantFiled: January 14, 2004Date of Patent: March 24, 2009Assignee: ASML Netherlands B.V.Inventor: Patricius Aloysius Jacobus Tinnemans
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Publication number: 20090033902Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.Type: ApplicationFiled: March 21, 2008Publication date: February 5, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Heine Melle Mulder, Johannes Jacobus, Matheus Baselmans, Adrianus Franciscus, Petrus Engelen, Markus Franciscus, Antonius Eurlings, Hendrikus Robertus, Marie Greevenbroek, Patricius Aloysius, Jacobus Tinnemans, Paul Van Der Veen, Wilfred Edward Endendijk