Abstract: A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

Abstract: Embodiments of the invention include a method of placing a substrate on a support. In an embodiment of the invention, the method includes determining a position of the substrate relative to a reference position via a sensor which outputs a sensor signal to a control unit, the determining including detecting the position of the substrate in a chamber, and determining a gripping position on the substrate; gripping the substrate at the gripping position with a gripper controlled by the control unit, and providing the substrate in a defined position on the support member, the providing including moving the substrate to a fixed position relative to the support member such that the center of the substrate arrives at a predetermined position on the support member.