Abstract: A lithography method and system comprise an array of individually controllable elements, a first datapath section, a second datapath section, and a quantization device. The array of individually controllable elements modulates a beam of radiation.. The first datapath section converts data defining a requested dose pattern into a stream of setpoint data defining a desired sequence of setpoints for the array of individually controllable elements. The second datapath section stores and reproduces the stream of setpoint data for the array of individually controllable elements. The quantization device digitizes the stream of setpoint data before it is passed from the first datapath section to the second datapath section. The first datapath section further comprises a noise controller configured to incorporate noise of a predetermined magnitude into the stream of setpoint data before it is digitized by the quantization device.

Abstract: A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.

Abstract: A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompress the compressed representation.

Abstract: A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

Abstract: A continuous source of radiation, for example a lamp, is used in conjunction with pixel grid imaging. In one example, the individually controllable elements operate at a frequency of at least about 50 kHz. To compensate for any distortion of an exposed spot a point spread function is adjusted to be shorter in a scanning direction.

Abstract: A lithography apparatus with a data-path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements. The data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. A device manufacturing method using elements of the lithography apparatus, and a flat panel display and integrated circuit device manufactured using the method.

Abstract: An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters for pattern sharpening, image log slope control, and/or CD biasing can also be used.

Abstract: A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

Abstract: An apparatus and system that form a hexagonal exposed spot grid on a substrate. This is accomplished by using a patterning device that directs a patterned beam onto a microlens array, which forms Fourier transformed spots of the pattered beam at the substrate. Through at least one of (a) moving of the substrate that is patterned by the patterning device and/or changing a frequency of a beam of radiation or (b) through a hexagonal configuration of the patterning device and the microlens array, the spots from the microlens array form the hexagonal exposed spot grid on the substrate.

Abstract: The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.