Patents by Inventor Patrick Choquet

Patrick Choquet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240093113
    Abstract: The invention relates to a substrate coated with a coating consisting of molybdenum (Mo), sulfur (S), tantalum (Ta) and oxygen (O) atoms present in the form of one or several compound(s) selected from among the compounds of formula (I): MowSxTayOz??(I) wherein w is equal to 0 or 1; x varies from 0 to 2; y varies from 0 to 1 and z varies from 0 to 3; said coating comprising at least 5% at of oxygen and said coating having a dense compact microstructure.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 21, 2024
    Applicant: Luxembourg Institute of Science and Technology
    Inventors: Jean-Baptiste CHEMIN, Patrick CHOQUET, Guillaume COLAS, Aurélien SAULOT, Michel YANN
  • Patent number: 11756770
    Abstract: A post-discharge plasma coating device for a wired substrate comprising an inner tubular electrode on an inner tubular wall for receiving the substrate and a precursor moving axially in a working direction; an outer tubular electrode coaxial with, and surrounding, the inner tubular electrode. The inner and outer electrodes are configured to be supplied with an electrical power source for producing a plasma when a plasma gas is supplied between the electrodes and is thereby excited, the plasma excited gas flowing axially in the working direction and reacting with the precursor in a coating area at the end of the inner tubular wall in the direction. The inner tubular wall extends axially towards the coating area at least until, in various instances beyond, the end of the outer electrode, in the working direction and at least one dielectric tubular wall extends axially between the inner tubular electrode and the outer tubular electrode.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: September 12, 2023
    Assignee: Luxembourg Institute of Science and Technology (LIST)
    Inventors: Simon Bulou, Patrick Choquet, Thomas Gaulain, Mathieu Gerard
  • Publication number: 20220154326
    Abstract: A coated steel substrate coated with a first coating including above 40 wt. % of chromium and optionally one or several elements chosen from yttrium, silicon, calcium, titanium, zirconium, vanadium, niobium and nickel in an amount below 10 wt. % for each element, the balance being chromium and a second coating including from 2 to 30 wt. % of Aluminum, from 10 to 40 wt. % of chromium and optionally one or several elements chosen from yttrium, silicon, calcium, titanium, zirconium, vanadium, niobium and nickel in an amount below 10 wt. % for each element, the balance being iron, the steel substrate including Cr?2.0% by weight; a method for the manufacture of this coated steel substrate; a method for the manufacture of a coated hot steel product; a coated hot steel product and the use of a hot steel product.
    Type: Application
    Filed: March 20, 2020
    Publication date: May 19, 2022
    Inventors: Thomas URIOS, Patrick CHOQUET, Sergey ERSHOV
  • Patent number: 10843224
    Abstract: A solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2-benzoquinone group and the catechol group is a 1,-dihydroxybenzene group.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: November 24, 2020
    Assignee: LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
    Inventors: Christophe Detrembleur, Cecile Vandeweerdt, Christelle Vreuls, Rodolphe Mauchauffe, Maryline Moreno-Couranjou, Nicolas Boscher, Patrick Choquet
  • Patent number: 10471465
    Abstract: The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: November 12, 2019
    Assignee: Luxembourg Institute of Science and Technology (LIST)
    Inventors: Nicolas Boscher, Patrick Choquet, David Duday, Florian Hilt
  • Publication number: 20190259583
    Abstract: A plasma post-discharge deposition device for depositing crystalline metal oxide derivative on a substrate, the device comprising a gas source with a substrate inlet, a post-discharge deposition chamber with a substrate outlet, the substrate inlet and the substrate outlet defining a longitudinal central axis, and a dielectric tube placed between the gas source and the deposition chamber on the longitudinal central axis; configured to confine a plasma discharge and comprising a discharge zone lying on the internal surface of the dielectric tube and a central zone centred on the longitudinal central axis. The deposition device is remarkable in that the central zone is located at a distance comprised between 1 mm and 2.5 mm from the internal surface of the dielectric tube. Also a plasma-enhanced chemical vapour deposition method.
    Type: Application
    Filed: September 14, 2017
    Publication date: August 22, 2019
    Applicant: Luxembourg Institute Of Science And Technology (LIST)
    Inventors: Kamal Baba, Nicolas Boscher, Simon Bulou, Patrick Choquet, Mathieu Gerard, Miguel Quesada Gonzalez
  • Publication number: 20190259577
    Abstract: A post-discharge plasma coating device for a wired substrate comprising an inner tubular electrode on an inner tubular wall for receiving the substrate and a precursor moving axially in a working direction; an outer tubular electrode coaxial with, and surrounding, the inner tubular electrode. The inner and outer electrodes are configured to be supplied with an electrical power source for producing a plasma when a plasma gas is supplied between the electrodes and is thereby excited, the plasma excited gas flowing axially in the working direction and reacting with the precursor in a coating area at the end of the inner tubular wall in the direction. The inner tubular wall extends axially towards the coating area at least until, in various instances beyond, the end of the outer electrode, in the working direction and at least one dielectric tubular wall extends axially between the inner tubular electrode and the outer tubular electrode.
    Type: Application
    Filed: September 8, 2017
    Publication date: August 22, 2019
    Inventors: Simon Bulou, Patrick Choquet, Thomas Gaulain, Mathieu Gerard
  • Patent number: 10283322
    Abstract: According to the process, the filiform component is continuously linearly moved through magnetic dipoles arranged opposite each other and around a tube constituting a treatment chamber, and the microwave energy is introduced between at least two magnetic dipoles.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: May 7, 2019
    Assignees: H.E.F, LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
    Inventors: Patrick Choquet, David Duday, Olivier Blandenet, Thierry Leon Lagarde
  • Patent number: 10155843
    Abstract: Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: December 18, 2018
    Assignees: Massachusetts Institute of Technology, Luxembourg Institute of Science and Technology
    Inventors: Karen K. Gleason, Minghui Wang, Nicolas D. Boscher, Patrick Choquet
  • Patent number: 9999901
    Abstract: The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Ra between 0.1 and 1.0 ?m and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W·cm?2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet “sticking” properties (high water sliding angle).
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: June 19, 2018
    Assignee: Luxembourg Institute of Science And Technology (LIST)
    Inventors: Nicolas Boscher, David Duday, Patrick Choquet, Stephane Verdier
  • Publication number: 20180112305
    Abstract: A vacuum deposition facility for continuously depositing coatings formed from metal alloys having at least two metallic elements on a running substrate is provided. The vacuum deposition facility includes a vacuum deposition chamber, a substrate running through the vacuum deposition chamber and an evaporation crucible inside the vacuum deposition chamber. The evaporation crucible includes a heater and a bath of molten metal alloy which has at least two metallic elements in a predetermined and constant ratio. The evaporation crucible evaporates the molten metal alloy into a vapor. The vacuum deposition facility also includes a coater inside the vacuum deposition chamber and connected to the evaporation crucible. The coater sprays a face of the running substrate with the vapor at a sonic velocity in order to deposit a coating on the running substrate. The vapor includes the at least two metallic elements in the predetermined and constant ratio.
    Type: Application
    Filed: December 21, 2017
    Publication date: April 26, 2018
    Inventors: Patrick Choquet, Eric Silberberg, Bruno Schmitz, Daniel Chaleix
  • Publication number: 20170297055
    Abstract: The invention provides a solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2-benzoquinone group and the catechol group is a 1,2-dihydroxybenzene group.
    Type: Application
    Filed: August 24, 2015
    Publication date: October 19, 2017
    Inventors: Christophe Detrembleur, Cecile Vandeweerdt, Christelle Vreuls, Rodolphe Mauchauffe, Maryline Moreno-Couranjou, Nicolas Boscher, Patrick Choquet
  • Publication number: 20170158809
    Abstract: Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone.
    Type: Application
    Filed: November 18, 2016
    Publication date: June 8, 2017
    Inventors: Karen K. Gleason, Minghui Wang, Nicolas D. Boscher, Patrick Choquet
  • Publication number: 20170050214
    Abstract: The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
    Type: Application
    Filed: May 6, 2015
    Publication date: February 23, 2017
    Applicant: Luxembourg Institute of Science and Technology (LIST)
    Inventors: Nicolas Boscher, Patrick Choquet, David Duday, Florian Hilt
  • Publication number: 20170032939
    Abstract: According to the process, the filiform component is continuously linearly moved through magnetic dipoles arranged opposite each other and around a tube constituting a treatment chamber, and the microwave energy is introduced between at least two magnetic dipoles.
    Type: Application
    Filed: March 26, 2015
    Publication date: February 2, 2017
    Applicants: H.E.F., LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
    Inventors: Patrick CHOQUET, David DUDAY, Olivier BLANDENET, Thierry Leon LAGARDE
  • Patent number: 9502214
    Abstract: An apparatus is provided that performs continuous cleaning of a surface of a grounded material which is coated with an organic substance. The apparatus includes a plurality of electrodes covered with a dielectric and disposed along the surface of the material. The electrodes are connected to a high-voltage generator using a MOS power transistor connected to a step up transformer to convert low-voltage pulses generated from a low-voltage power supply into high-voltage pulses. The apparatus is configured to provide a pulsed electric field wherein the maximum voltage of the positive pulses U+ is greater than the arc-striking voltage Ua, and the maximum absolute value of the voltage of the negative pulses U? is less than the striking voltage Ua.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: November 22, 2016
    Assignee: USINOR
    Inventors: Daniel Chaleix, Patrick Choquet, Gerard Baravian, Bernard Lacour, Vincent Puech
  • Publication number: 20150273522
    Abstract: The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Ra between 0.1 and 1.0 ?m and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W·cm?2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet “sticking” properties (high water sliding angle).
    Type: Application
    Filed: October 2, 2013
    Publication date: October 1, 2015
    Inventors: Nicolas Boscher, David Duday, Patrick Choquet, Stephane Verdier
  • Publication number: 20130239890
    Abstract: The present invention provides a process for coating a substrate. A metal alloy layer including at least two metallic elements is continuously deposited on the substrate by a vacuum deposition facility. The facility includes a vapor jet coater for spraying the substrate with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process may advantageously be used for depositing Zn—Mg coatings. The invention also provides a vacuum deposition facility for continuously depositing coatings formed from metal alloys, for implementing the process.
    Type: Application
    Filed: April 25, 2013
    Publication date: September 19, 2013
    Applicant: ARCELORMITTAL FRANCE
    Inventors: Patrick Choquet, Eric Silberberg, Bruno Schmitz, Daniel Chaleix
  • Patent number: 8481120
    Abstract: The invention relates to a process for coating a substrate (S) whereby a metal alloy layer comprising at least two metallic elements is continuously deposited on the substrate (S) by means of a vacuum deposition facility (1) comprising a vapor jet coater (7) for spraying the substrate (S) with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process is more particularly intended for depositing Zn—Mg coatings. The invention also relates to a vacuum deposition facility (1) for continuously depositing coatings formed from metal alloys, for implementing the process.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: July 9, 2013
    Assignee: ArcelorMittal France
    Inventors: Patrick Choquet, Eric Silberberg, Bruno Schmitz, Daniel Chaleix
  • Publication number: 20130017341
    Abstract: The present disclosure provides a method for forming a porous colorimetric gas sensing layer. In various embodiments, the method comprises providing a mixture of an organic solvent, a polymer forming material and a gas sensing compound or gas sensing particles. The method additionally comprises depositing the mixture (sprayed or vaporized) on at least a surface portion of a substrate. Thereafter, an atmospheric pressure plasma is applied to the surface portion to form a polymer layer comprising the gas sensing compound or particles. The steps of depositing the mixture and applying the plasma can be repeated multiple times to form a plurality of stacked or superposed polymer layers comprising the gas sensing compound or particles.
    Type: Application
    Filed: July 6, 2012
    Publication date: January 17, 2013
    Applicant: CENTRE DE RECHERCHE PUBLIC - GABRIEL LIPPMANN
    Inventors: Nicolas Boscher, Patrick Choquet, David Duday