Patents by Inventor Patrick F. Stone

Patrick F. Stone has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor thermal process control
    Patent number: 7778533
    Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.
    Type: Grant
    Filed: September 12, 2002
    Date of Patent: August 17, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Wolfgang R. Aderhold, Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone
  • Semiconductor thermal process control utilizing position oriented temperature generated thermal mask
    Patent number: 7667162
    Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: February 23, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Wolfgang R. Aderhold, Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone
  • Semiconductor thermal process control
    Publication number: 20040052512
    Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.
    Type: Application
    Filed: September 12, 2002
    Publication date: March 18, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Wolfgang R. Aderhold, Balasubramanian Ramachandran, Leonid M. Tertitski, Patrick F. Stone