Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum including an inlet to receive heat transfer fluid and a plurality of flow channels to direct the heat transfer fluid through a center portion of the showerhead to an outlet to control a temperature of the showerhead, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

Abstract: A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum including an inlet to receive heat transfer fluid and a plurality of flow channels to direct the heat transfer fluid through a center portion of the showerhead to an outlet to control a temperature of the showerhead, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.

Abstract: A substrate processing system includes a showerhead including a stem portion and a head portion. The stem portion is in fluid communication with a process gas source, and the head portion is arranged to provide process gases from the process gas source to a reaction volume of a processing chamber below the showerhead to generate plasma in the reaction volume. A suppressor is arranged above the head portion of the showerhead, extends from the stem portion toward sidewalls of the processing chamber, and is sealed against the sidewalls of the processing chamber or sealed against an enclosure surrounding the suppressor. The suppressor, the sidewalls, and a top surface of the processing chamber, the suppressor and the enclosure, or the suppressor, the enclosure, and the top surface define a partitioned volume of the processing chamber above the showerhead. The partitioned volume is in fluid communication with a purge gas source.

Abstract: A substrate processing system includes a showerhead including a stem portion and a head portion. The stem portion is in fluid communication with a process gas source, and the head portion is arranged to provide process gases from the process gas source to a reaction volume of a processing chamber below the showerhead to generate plasma in the reaction volume. A suppressor is arranged above the head portion of the showerhead, extends from the stem portion toward sidewalls of the processing chamber, and is sealed against the sidewalls of the processing chamber or sealed against an enclosure surrounding the suppressor. The suppressor, the sidewalls, and a top surface of the processing chamber, the suppressor and the enclosure, or the suppressor, the enclosure, and the top surface define a partitioned volume of the processing chamber above the showerhead. The partitioned volume is in fluid communication with a purge gas source.

Abstract: A hemostasis mechanism includes a housing having a valve body, a connector coupled to a distal end of the valve body, and a cap coupled to a proximal end of the valve body. A first valve is within the housing and has a fixed state of axial compression between the valve body and the cap. A second valve is within the housing and has a range of states of axial compression between the valve body and the connector. The first valve has a self-closing bias and forms a lower pressure seal about a medical device pushed therethrough. The second valve has a self-opening bias and forms a higher pressure seal about the medical device via adjustment of its state of axial compression.

Abstract: Assist circuits for SRAM memory tests allow voltage scaling in low-power SRAMs. Word line level reduction (WLR) and negative bit line (NBL) boost assist techniques improve read stability and write margin of SRAM core-cells, respectively, when the memory operates at a lowered supply voltage. Assist circuits are activated at particular points in the memory cell circuit. The assist circuits are selectively activated for modifying the voltage along particular circuit elements to identify the potential defects that might be otherwise masked until substantially large. A March test invokes elements for activating the assist circuits to identify defects and indicate functional fault models (FFMs) associated with the defects.

Abstract: A device for controlling a power supply for a functional block in an integrated circuit, the device comprising: a signal generator configured to provide a clock signal to the functional block, an antenna comprising a transistor, and being located proximate to the functional block, the antenna being configured to receive the clock signal from the signal generator, and wherein the transistor of the antenna receives electrical power from the same power source that delivers power to the functional block, means to measure the clock signal output from the antenna, and output a control signal, and feedback means to control the voltage of the power supply to the functional block on the basis of the control signal.

Abstract: A device for testing pneumatic circuits and for measuring the leakage rate from reference pressure lines onboard an aircraft, connected to a plenum chamber. The device includes a multi-pressure system, comprising several sensors each connected to a reference pressure line, first solenoid valves arranged on the input channels to this multi-pressure system, and connected to the reference pressure lines through first connectors, second solenoid valves arranged on the reference pressure lines, a pressure controller module that is connected to all the first solenoid valves through a second connector, an electronic board that controls the solenoid valves and calibration of the multi-pressure system, a control device. The invention also relates to a method making use of this device.

Abstract: Assist circuits for SRAM memory tests allow voltage scaling in low-power SRAMs. Word line level reduction (WLR) and negative bit line (NBL) boost assist techniques improve read stability and write margin of SRAM core-cells, respectively, when the memory operates at a lowered supply voltage. Assist circuits are activated at particular points in the memory cell circuit. The assist circuits are selectively activated for modifying the voltage along particular circuit elements to identify the potential defects that might be otherwise masked until substantially large. A March test invokes elements for activating the assist circuits to identify defects and indicate functional fault models (FFMs) associated with the defects.

Abstract: A circuit arrangement may include: a memory, composed of a memory cell array, including a plurality of memory cells, and a peripheral circuitry; a voltage source configured to provide at least one supply voltage; a test circuit integrated with the memory cell array and the voltage source, wherein the test circuit receives the supply voltage; the test circuit including: at least one test memory cell; at least one failure detection circuit configured to detect a data retention failure in the at least one test memory cell.

Abstract: A device for controlling a power supply for a functional block in an integrated circuit, the device comprising: a signal generator configured to provide a clock signal to the functional block, an antenna comprising a transistor, and being located proximate to the functional block, the antenna being configured to receive the clock signal from the signal generator, and wherein the transistor of the antenna receives electrical power from the same power source that delivers power to the functional block, means to measure the clock signal output from the antenna, and output a control signal, and feedback means to control the voltage of the power supply to the functional block on the basis of the control signal.

Abstract: A power supply noise measurement device for inclusion with an integrated circuit, the integrated circuit having a functional block, the noise measurement device comprising: a signal generator configured to provide a clock signal to the functional block, an antenna comprising a transistor, and being located proximate to the functional block, the antenna being configured to receive the clock signal from the signal generator, and a jitter estimator configured to provide a measure of the relative jitter between a signal output from the antenna and a reference clock signal, wherein the transistor of the antenna receives electrical power from the same power source that delivers power to the functional block.

Abstract: A hemostasis mechanism includes a housing having a valve body, a connector coupled to a distal end of the valve body, and a cap coupled to a proximal end of the valve body. A first valve is within the housing and has a fixed state of axial compression between the valve body and the cap. A second valve is within the housing and has a range of states of axial compression between the valve body and the connector. The first valve has a self-closing bias and forms a lower pressure seal about a medical device pushed therethrough. The second valve has a self-opening bias and forms a higher pressure seal about the medical device via adjustment of its state of axial compression.

Abstract: A circuit arrangement may include: a memory, composed of a memory cell array, including a plurality of memory cells, and a peripheral circuitry; a voltage source configured to provide at least one supply voltage; a test circuit integrated with the memory cell array and the voltage source, wherein the test circuit receives the supply voltage; the test circuit including: at least one test memory cell; at least one failure detection circuit configured to detect a data retention failure in the at least one test memory cell.

Abstract: When cold and in the non-coated state, the aerodynamic profile is substantially identical to a nominal profile determined by the Cartesian coordinates X,Y,Z? given in Table 1, in which the coordinate Z? is the quotient D/H where D is the distance of the point under consideration from a first reference plane P0 situated at the base of the nominal profile, and H is the height of said profile measured from the first reference plane to a second reference plane P1. The measurements D and H are taken radially relative to the axis of the turbine, while the X coordinate is measured in the axial direction of the turbine.

Abstract: The systems and methods disclosed herein employ a combination of digital three-dimensional modeling and rapid fabrication technologies to provide pre-indexed, pre-registered, and/or precut components for articulated dental models. Dental articulators and components of dental models as described herein use a positioning key to encode positional information for components of the dental model, and/or a reference grid on mounting surfaces to enforce local accuracy of fabricated parts against a fixed reference array.