Abstract: This invention is directed to the use of fluorinated polymeric surface treatment agents in electrochemical applications, particularly in the manufacture of fuel cell components.

Abstract: A stain-resist agent for polyamides fibers, its preparation and use are disclosed. The stain-resist agent is the condensation product of a phenolic of which at least 67 weight percent is bis-hydroxyphenylsulfone and the remainder p-cresol, p-phenolsulfonic acid or methyl-p-hydroxybenzoate, with from about 0.4 to 2.3 moles, per mole of the phenolic of a mercapto-substituted carboxylic acid selected from mercaptosuccinic acid, mercaptoacetic acid or mercaptopropionic acid; and about 1.4 to about 3.7 moles per mole of mercapto-substituted carboxylic acid of formaldehyde and sufficient base to neutralize all of the mercapto-substituted carboxylic acid groups and part but not all of the phenolic groups. The product contains about 3 to about 6 phenolic moieties with a molecular weight of 1500 to 2500 being preferred. Generally the reaction is carried out at reflux temperature (100.degree. to 103.degree. C.) for a period of 24 to 72 hours. Generally the stain-resist is applied to the polyamide fibers at a pH of 1.

Abstract: A method of emulsion breaking comprising contacting an emulsion with a substrate having adhered thereto an alkylphenol-polyethylene oxide-acrylate polymer. The emulsion breaking material is used to separate water-in-oil emulsion by coalescence.

Abstract: A process for imparting stain resistance to polyamide substrates in continuous processes such as those using a Fluidyer.RTM. apparatus or a Flexnip.RTM. applicator and involving the application of a stain-resist composition containing a mixture of a hydrolyzed copolymer of maleic anhydride and one or more ethylenically unsaturated aromatic monomers with a sulfonated phenol-formaldehyde condensation product is disclosed wherein the stain-resist composition is applied at a pH between about 1.5 and about 3.0 in the prescence of an anionic surfactant in the form of an alkyl aryl sulfonic acid or an alkyl aryl sulfonate salt.

Abstract: Stain-resistant compositions comprising sulfonated phenol-formaldehyde condensation products and polymers of maleic anhydride and one or more ethylenically unsaturated monomers, polyamide textile substrates treated with the same, and processes for their preparation. The stain-resistant compositions and substrates possess improved stain resistance but do not suffer from yellowing to the extent that previously known materials do.

Abstract: Stain-resistant, polyamide textile substrates treated with compositions comprising hydrolyzed ethylenically unsaturated aromatic/maleic anhydride polymers and processes for their preparation. The treated substrates possess stain resistance that is as good as or better than do previously known stain-resist treated substrates but do not suffer from yellowing to the extent that previously known treated substrates do.

Abstract: Stain-resistant substrates comprising sulfonated phenol-formaldehyde condensation products and polymers of ethylenically unsaturated monomers, polyamide textile substrates treated wtih the same, and processes for their preparation. The stain-ressitant compositions and substrates possess improved stain resistance but do not suffer from yellowing to the extent that previously known materials do.

Abstract: Stain-resistant compositions comprising sulfonated phenol-formaldehyde condensation products and polymers of ethylenically unsaturated monomers, polyamide textile substrates treated with the same, and processes for their preparation. The stain-resistant compositions and substrates possess improved stain resistance but do not suffer from yellowing to the extent that previously known materials do.

Abstract: This invention resides in a polymerization process which is catalyzed by an oxyanion which can form a conjugate acid having a pKa (DMSO) of about 5 to about 24.

Abstract: Premilled semichloro copper phthalocyanine or partially sulfonated semichloro copper phthalocyanine is slurried and stirred with sulfuric acid (50-60% and preferably 55-59% in the case of semichloro copper phthalocyanine and 50-61% and preferably 58-61% in the case of partially sulfonated semichloro copper phthalocyanine) at 50.degree.-85.degree. C., preferably 65.degree.-75.degree. C. for 1/2 to 4 hours. The slurry is diluted with to less than 35% sulfuric acid concentration and stirred at 60.degree.-95.degree. C. for 1/2 to 4 hours. The resulting highly transparent pigment is filtered and dried.

Abstract: Process for converting premilled quinacridone to pigmentary form by contacting the premilled quinacridone with aqueous alkaline medium in the presence of a quaternary ammonium compound.

Abstract: A process for preparing beta or gamma crystals of linear quinacridone, substituted quinacridone or solid solutions thereof by contacting premilled quinacridone with 45-60% by weight sulfuric acid and 0-10% by weight of a surfactant based on the quinacridone at a weight ratio of acid to quinacridone of 3:1-6:1 to form a slurry, agitating said slurry for a period of time at 45.degree.-75.degree. C., adding water to form a dilute slurry, agitating said dilute slurry for a period of time at 75.degree.-95.degree. C. and separating quinacridone from the liquid of the dilute slurry.