Patents by Inventor Patrick Helly

Patrick Helly has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming low dielectric constant layer
    Publication number: 20070077778
    Abstract: Dielectric layers having a low dielectric constant are fabricated by using an asymmetric organocyclosiloxane as a precursor gas. The carbon content of the deposited layer is reduced to less than about 50 percent by use an oxidizing agent, a silicon containing compound, or a combination thereof.
    Type: Application
    Filed: October 4, 2005
    Publication date: April 5, 2007
    Inventors: Ce Ma, Qing Wang, Patrick Helly, Graham McFarlane
  • Method and apparatus for using solution based precursors for atomic layer deposition
    Publication number: 20060269667
    Abstract: A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.
    Type: Application
    Filed: April 10, 2006
    Publication date: November 30, 2006
    Inventors: Ce Ma, Qing Wang, Patrick Helly, Richard Hogle