Abstract: A shape memory polymer contact lens mold is formed from a sheet of a shape memory polymer in a press, an agile tool or by an agile tool formed by an inert gas at a temperature at or above the glass transition temperature which is thereupon cooled to below the glass transition temperature and removed therefrom.

Abstract: A shape memory polymer contact lens mold is formed from a sheet of a shape memory polymer in a press, an agile tool or by an agile tool formed by an inert gas at a temperature at or above the glass transition temperature which is thereupon cooled to below the glass transition temperature and removed therefrom.

Abstract: A fiber optic moisture sensor is described that can detect the presence or concentration of an analyte in an environment; additionally, a method for making the sensor is described. The invention consists of three primary components: a sensor head, an optical link, and a sensor readout. The sensor head contains the sensing medium, which is comprised of a superabsorbing polymer that hosts a hydrochromic material. The superabsorbing polymer attracts moisture from the environment it is sensing until an equilibrium concentration of water in the environment is obtained effectively magnifying the ability of the hydrochromic material to sense very small concentrations of moisture. An optical link allows light to travel to and from the sensor head. The sensor readout has the necessary electronics to calibrate the optical signal from the sensor head, and the ability to determine and communicate the moisture concentration in the environment being sensed to the user or process control system.

Abstract: A method and apparatus are provided for filtering incident radiation to protect imaging sensors from the damaging effects of high intensity radiation. The apparatus comprises a filter and a plurality of mirrors disposed within a cube. The filter is positioned diagonally within the cube so that portions of the incident radiation reflected by the filter are directed to a beam-stop on a surface of the cube. Portions of the radiation passed by the filter are directed by the mirrors to pass through the filter a plurality of times. Passing the radiation through a single filter a plurality of times provides a high density imaging system in a physically compact geometric shape. A focused beam passes through the filter in regions of successively greater optical gain. High intensity radiation thermally activates the filter to reject the radiation and protect the sensors.

Abstract: A spatially graded optical switch is described which comprises a transparent substrate, a layer of optically switchable material deposited on the substrate and having optical thickness which is a preselected function of radial distance from the center of the substrate, and electrical or thermal means for switching the material between an OFF state characterized by high transmission (or reflection) and an ON state at which transmission (or reflection) is attenuated smoothly with radius across the switch, according to a preselected profile, from substantially zero at the center to about 100% at the outer edge.

Abstract: A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate. A fine-grained nucleation geometry, established at the nucleation sites, is maintained as the diamond film is deposited over the entire substrate after the silicon nitride resist is removed. The process can be extended to form surface relief features, such as "moth eye" surfaces, and microstructures of fine-grained polycrystalline diamond, such as rotatable microgears and surface relief patterns, that have the desirable characteristics of hardness, wear resistance, thermal conductivity, chemical inertness, anti-reflectance, and a low coefficient of friction.

Abstract: A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. A conventional polymeric resist process may be used to deposit a pattern of high temperature resist material. With the high temperature resist in place and the polymeric resist removed, a high temperature deposition process may proceed without degradation of the resist pattern. After a desired film of material has been deposited, the high temperature resist is removed to leave the film in the pattern defined by the resist. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate.

Abstract: A high performance wavelength stabilizing laser mirror/output coupler, particularly useful for stabilizing a laser cavity within a narrow bandwidth, is described, which comprises a substrate of selected material on which is deposited an optical coating having a refractive index profile over the thickness thereof which is selectively continuously modulated between preselected high and low values to define a preselected narrow reflectance spectrum.