Patents by Inventor Patrick Joseph Helly

Patrick Joseph Helly has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for forming low-k dielectric films
    Patent number: 6936537
    Abstract: The use of a polyhedral oligomeric silsesquioxane compound and linking agent to form an ultra low-k dielectric film on semiconductor or integrated circuit surfaces is disclosed. The reaction between the polyhedral oligomeric silsesquioxane compound and linking agent is done in a chemical vapor deposition chamber.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: August 30, 2005
    Assignee: The BOC Group, Inc.
    Inventors: Richard A. Hogle, Patrick Joseph Helly, Ce Ma, Laura Joy Miller
  • Methods for forming low-k dielectric films
    Publication number: 20020192980
    Abstract: The use of a polyhedral oligometric silsesquioxane compound and linking agent to form an ultra low-k dielectric film on semiconductor or integrated circuit surfaces is disclosed. The reaction between the polyhedral oligometric silsesquioxane compound and linking agent is done in a chemical vapor deposition chamber.
    Type: Application
    Filed: April 12, 2002
    Publication date: December 19, 2002
    Inventors: Richard A. Hogle, Patrick Joseph Helly, Ce Ma, Laura Joy Miller