Patents by Inventor Patrick-Kurt Dannecker

Patrick-Kurt Dannecker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250019520
    Abstract: Relief precursors with an enhanced capacity to be developed into high performing relief structures, more in particular high quality relief structures such as printing plates. A photosensitive composition (PC) for forming a photosensitive layer of a relief precursor (RP), comprising particular stabilizers and binders. By including the stabilizer and binder as described herein the stability of the melt of the photosensitive composition during production, e.g. production by extrusion, can be enhanced significantly. Such enhanced stability could be achieved without or with minimal undesired impact on the resulting printing performance and/or imaging characteristics of the reliefs formed by developing the relief precursors.
    Type: Application
    Filed: July 2, 2024
    Publication date: January 16, 2025
    Applicant: XSYS Germany GmbH
    Inventors: Isabel Schlegel, Patrick-Kurt Dannecker
  • Publication number: 20250004368
    Abstract: A relief precursor includes a dimensionally stable support, and at least one photopolymer layer including at least one binder, at least one photoinitiator or photoinitiating system, and at least one component with at least one unsaturated group and at least one plasticizer. The at least one plasticizer is a bio-based plasticizer, and has a UV transmission at 365 nm of a solution of 5 wt % plasticizer in n-hexane of higher than 15%.
    Type: Application
    Filed: May 9, 2022
    Publication date: January 2, 2025
    Applicant: XSYS Germany GmbH
    Inventors: Patrick-Kurt Dannecker, Isabel Schlegel