Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.

Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.

Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.

Abstract: Embodiments presented herein provide techniques for controlling deposition processes in a process chamber based on monitoring contaminant gas levels in a chamber. Embodiments include generating a data model defining acceptable levels within the chamber for each of a plurality of gas types. Gas levels of the plurality of gas types within the chamber are monitored using one or more sensor devices within the chamber. Upon determining that at least one gas level within the chamber violates the acceptable level for the respective gas type within the data model, embodiments perform a corrective action for the chamber.

Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.

Abstract: Systems and methods for providing a prioritization of the focus and allocation of available resources and/or funding for due diligence analyses of a variety of candidate projects competing for limited funding are disclosed. Various methods may also determine a confidence level metrics associated with the information and/or estimates associated with the candidate projects. Evolutionary algorithms may be applied to perform multi-objective optimization of objectives based, at least in part, on currently available information and/or estimates associated with the candidate projects. A priority score, for the purpose of allocating due diligence attention and resources to increase confidence levels in assumptions associated with candidate projects, may be determined for a particular project based, at least in part, on the current confidence level associated with that particular project and the percentage of non-dominated projects within which the particular project is included.

Abstract: Embodiments presented herein provide techniques for controlling deposition processes in a process chamber based on monitoring contaminant gas levels in a chamber. Embodiments include generating a data model defining acceptable levels within the chamber for each of a plurality of gas types. Gas levels of the plurality of gas types within the chamber are monitored using one or more sensor devices within the chamber. Upon determining that at least one gas level within the chamber violates the acceptable level for the respective gas type within the data model, embodiments perform a corrective action for the chamber.

Abstract: Systems and methods for providing a prioritization of the focus and allocation of available resources and/or funding for due diligence analyses of a variety of candidate projects competing for limited funding are disclosed. Various methods may also determine a confidence level metrics associated with the information and/or estimates associated with the candidate projects. Evolutionary algorithms may be applied to perform multi-objective optimization of objectives based, at least in part, on currently available information and/or estimates associated with the candidate projects. A priority score, for the purpose of allocating due diligence attention and resources to increase confidence levels in assumptions associated with candidate projects, may be determined for a particular project based, at least in part, on the current confidence level associated with that particular project and the percentage of non-dominated projects within which the particular project is included.

Abstract: It has been observed that Si introduced into an Al metal line of an Al, Ti, and Si-containing layer stack of an integrated circuit, at concentrations uniformly less than the solid solubility of Si in Al, results in a reduction in Al metal line voiding. Such voiding is a stress induced phenomenon and the introduction of Si appears to reduce stresses in the Al metal lines. By controlling Ti deposition conditions to achieve desired thickness and grain-size characteristics of the Ti underlayer, a self-regulating filter for introduction of Si into the Al metal layer is provided. Si is introduced into the Al metal layer by migration through a suitably deposited Ti layer, rather than during Al layer deposition.

Abstract: A charge controlled adaptive-optics system is disclosed for correcting phase distortion in a wavefront of a propagating optical wavefront in real time. In a preferred embodiment a selectively deformable piezoelectric mirror receives an incoming distorted optical wavefront and reflects it to a lenslet array optical sensor. The sensor generates a large plurality of focused light points, the offset positions of which represent wavefront tilts at a plurality of locations on the distorted wavefront. A misalignment calibration system calculates a plurality of calibration signals representing aberrations in the mirror surface and the sensor, and converts the signals into a plurality of representative light rays of varying intensity. The light ray are then superimposed on the light points to form a plurality of calibrated light points, which are then input to an electron-beam generating system.