Patents by Inventor Patrick Lawrence Morse
Patrick Lawrence Morse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200266038Abstract: A rotary sputtering cathode assembly is provided that comprises a rotatable target cylinder having a first end and an opposing second end. A first power transfer apparatus is configured to carry radio frequency power to the first end of the target cylinder, and a second power transfer apparatus is configured to carry radio frequency power to the second end of the target cylinder. Radio frequency power signals are simultaneously delivered to both of the first and second ends of the target cylinder during a sputtering operation.Type: ApplicationFiled: May 7, 2020Publication date: August 20, 2020Applicant: Bühler AGInventors: Daniel Theodore Crowley, Patrick Lawrence Morse
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Patent number: 10727034Abstract: A magnet bar assembly for a rotary target cathode comprises a support structure, a magnet bar structure movably attached to the support structure and including a plurality of magnets, and a positioning mechanism operatively coupled to the support structure and the magnet bar structure. The positioning mechanism is configured to move the magnet bar structure between a retracted position and a deployed position while inside a magnetic target material cylinder. The retracted position substantially reduces a magnetic force between the magnets and a magnetic target material of a target cylinder when the magnet bar assembly is inserted into the target cylinder or removed from the target cylinder. The deployed position substantially increases the magnetic force between the magnets and the magnetic target material when the magnet bar assembly is in the target cylinder, and allows a magnetic field from the magnet bar structure to penetrate through the magnetic target material.Type: GrantFiled: August 16, 2017Date of Patent: July 28, 2020Assignee: Sputtering Components, Inc.Inventors: Patrick Lawrence Morse, Daniel Theodore Crowley
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Patent number: 10699885Abstract: A rotary sputtering cathode assembly is provided that comprises a rotatable target cylinder having a first end and an opposing second end. A first power transfer apparatus is configured to carry radio frequency power to the first end of the target cylinder, and a second power transfer apparatus is configured to carry radio frequency power to the second end of the target cylinder. Radio frequency power signals are simultaneously delivered to both of the first and second ends of the target cylinder during a sputtering operation.Type: GrantFiled: August 28, 2015Date of Patent: June 30, 2020Assignee: Bühler AGInventors: Daniel Theodore Crowley, Patrick Lawrence Morse
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Patent number: 10273570Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.Type: GrantFiled: June 13, 2016Date of Patent: April 30, 2019Assignee: General Plasma, Inc.Inventors: John E. Madocks, Patrick Lawrence Morse, Phong Ngo
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Publication number: 20190057848Abstract: A magnet bar assembly for a rotary target cathode comprises a support structure, a magnet bar structure movably attached to the support structure and including a plurality of magnets, and a positioning mechanism operatively coupled to the support structure and the magnet bar structure. The positioning mechanism is configured to move the magnet bar structure between a retracted position and a deployed position while inside a magnetic target material cylinder. The retracted position substantially reduces a magnetic force between the magnets and a magnetic target material of a target cylinder when the magnet bar assembly is inserted into the target cylinder or removed from the target cylinder. The deployed position substantially increases the magnetic force between the magnets and the magnetic target material when the magnet bar assembly is in the target cylinder, and allows a magnetic field from the magnet bar structure to penetrate through the magnetic target material.Type: ApplicationFiled: August 16, 2017Publication date: February 21, 2019Inventors: Patrick Lawrence Morse, Daniel Theodore Crowley
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Publication number: 20170278685Abstract: A rotary sputtering cathode assembly is provided that comprises a rotatable target cylinder having a first end and an opposing second end. A first power transfer apparatus is configured to carry radio frequency power to the first end of the target cylinder, and a second power transfer apparatus is configured to carry radio frequency power to the second end of the target cylinder. Radio frequency power signals are simultaneously delivered to both of the first and second ends of the target cylinder during a sputtering operation.Type: ApplicationFiled: August 28, 2015Publication date: September 28, 2017Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse
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Patent number: 9758862Abstract: One embodiment is directed to a magnetron assembly comprising a plurality of magnets, and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds the perimeter of the inner portion. The end portions of the linear array comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections of the outer portion. The magnets in each turnaround section are arranged to form at least two or more different curves in the magnetic field that are offset from each along the target rotation axis.Type: GrantFiled: September 3, 2013Date of Patent: September 12, 2017Assignee: Sputtering Components, Inc.Inventor: Patrick Lawrence Morse
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Publication number: 20160289820Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.Type: ApplicationFiled: June 13, 2016Publication date: October 6, 2016Applicant: GENERAL PLASMA INC.Inventors: JOHN E. MADOCKS, PATRICK LAWRENCE MORSE, PHONG NGO
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Patent number: 9418823Abstract: A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure, and at least one actuation mechanism coupled to the rigid support structure and configured to change a distance of the magnet bar structure from a surface of a rotatable target cylinder. The magnetron assembly also includes a position indicating mechanism operative to measure a position of the magnet bar structure relative to the surface of the rotatable target cylinder. A communications device is configured to receive command signals from outside of the magnetron assembly and transmit information signals to outside of the magnetron assembly.Type: GrantFiled: September 6, 2013Date of Patent: August 16, 2016Assignee: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, John Robert German
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Publication number: 20160225591Abstract: A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.Type: ApplicationFiled: April 8, 2016Publication date: August 4, 2016Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, John Robert German, William A. Meredith, JR.
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Patent number: 9406487Abstract: One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.Type: GrantFiled: December 23, 2013Date of Patent: August 2, 2016Assignee: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, William A. Meredith, Jr., John Robert German, Michelle Lynn Neal
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Patent number: 9388490Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.Type: GrantFiled: October 26, 2010Date of Patent: July 12, 2016Assignee: General Plasma, Inc.Inventors: John E. Madocks, Patrick Lawrence Morse, Phong Ngo
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Patent number: 9362093Abstract: One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.Type: GrantFiled: December 23, 2013Date of Patent: June 7, 2016Assignee: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, William A. Meredith, Jr., John Robert German, Michelle Lynn Neal
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Patent number: 9312108Abstract: A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.Type: GrantFiled: April 28, 2014Date of Patent: April 12, 2016Assignee: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, John Robert German, William A. Meredith, Jr.
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Publication number: 20160064191Abstract: One embodiment is directed to an apparatus including a plasma source and operation electronics coupled to the plasma source. The plasma source includes at least two electrodes configured to generate plasma. The operation electronics are configured to generate plasma with the at least two electrodes and apply an ion flux modification bias to the at least two electrodes.Type: ApplicationFiled: November 12, 2015Publication date: March 3, 2016Inventor: Patrick Lawrence Morse
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Patent number: 9198274Abstract: One embodiment is directed to a plasma source comprising a cavity and at least first and second electrodes. The plasma source is configured to, during a first portion of each cycle, bias the first electrode as a cathode and use the second electrode as an anode, during a second portion of each cycle, apply an ion flush bias to the first and second electrodes, during a third portion of each cycle, bias the second electrode as a cathode and use the first electrode as an anode, and during a fourth portion of each cycle, apply an ion flush bias to the first and second electrodes. Other embodiments are disclosed.Type: GrantFiled: July 1, 2013Date of Patent: November 24, 2015Assignee: Sputtering Components, Inc.Inventor: Patrick Lawrence Morse
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Publication number: 20150120001Abstract: A decentralized process controller comprises at least two programmable interface modules in operative communication with each other. Each of the interface modules includes a processor and is configurable for connection to separate field devices comprising at least one sensor device and at least one actuator device. The at least two programmable interface modules are configurable as a stand-alone process control loop when one of the interface modules is connected to the sensor device, and the other of the interface modules is connected to the actuator device.Type: ApplicationFiled: October 31, 2013Publication date: April 30, 2015Applicant: Sputtering Components, Inc.Inventors: John Robert German, William A. Meredith, JR., Patrick Lawrence Morse, Brian Rooney
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Publication number: 20140246310Abstract: A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure, and at least one actuation mechanism coupled to the rigid support structure and configured to change a distance of the magnet bar structure from a surface of a rotatable target cylinder. The magnetron assembly also includes a position indicating mechanism operative to measure a position of the magnet bar structure relative to the surface of the rotatable target cylinder. A communications device is configured to receive command signals from outside of the magnetron assembly and transmit information signals to outside of the magnetron assembly.Type: ApplicationFiled: September 6, 2013Publication date: September 4, 2014Applicant: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, John Robert German
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Publication number: 20140246312Abstract: A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.Type: ApplicationFiled: April 28, 2014Publication date: September 4, 2014Applicant: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, John Robert German, William A. Meredith, JR.
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Publication number: 20140184073Abstract: One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.Type: ApplicationFiled: December 23, 2013Publication date: July 3, 2014Applicant: Sputtering Components, Inc.Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, William A. Meredith, JR., John Robert German, Michelle Lynn Neal