Patents by Inventor Patrick LoPresti

Patrick LoPresti has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Block-to-block reticle inspection
    Patent number: 10539512
    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: January 21, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden
  • Block-to-Block Reticle Inspection
    Publication number: 20180003647
    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.
    Type: Application
    Filed: September 18, 2017
    Publication date: January 4, 2018
    Inventors: Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden
  • Block-to-block reticle inspection
    Patent number: 9766185
    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: September 19, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden
  • Method and system for hybrid reticle inspection
    Patent number: 9208552
    Abstract: A semiconductor inspection apparatus performs a hybrid inspection process including cell-to-cell inspection, die-to-die inspection and die-to-golden or die-to-database inspection. The apparatus creates a golden image of a reticle complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection. Alternatively, the apparatus creates a reduced database complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: December 8, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Carl Hess, John D. Miller, Shan Xue, Patrick LoPresti
  • Block-to-Block Reticle Inspection
    Publication number: 20150078650
    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.
    Type: Application
    Filed: August 22, 2014
    Publication date: March 19, 2015
    Inventors: Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden
  • Method and System for Hybrid Reticle Inspection
    Publication number: 20130279792
    Abstract: A semiconductor inspection apparatus performs a hybrid inspection process including cell-to-cell inspection, die-to-die inspection and die-to-golden or die-to-database inspection. The apparatus creates a golden image of a reticle complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection. Alternatively, the apparatus creates a reduced database complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection.
    Type: Application
    Filed: April 23, 2012
    Publication date: October 24, 2013
    Applicant: KLA-Tencor Corporation
    Inventors: Carl Hess, John D. Miller, Shan Xue, Patrick LoPresti