Patents by Inventor Patrick M. Maxton

Patrick M. Maxton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100126555
    Abstract: A solar cell concentrating apparatus includes a parabolic reflector focusing a beam of light on an array of photovoltaic cells to generate electric current. The photocell array includes a number of triangular shaped segments arranged in a polygon. Surrounding the triangular shaped segments is another set of solar cells, each having a trapezoidal shape. The trapezoidal cells each have a larger surface area than that of the adjacent triangular shaped cell. The electric current produced by each trapezoidal cell is approximately the same as that of the smaller triangular shaped cells, which are subject to more intense incident light due to the beam's Gaussian spot profile.
    Type: Application
    Filed: November 19, 2009
    Publication date: May 27, 2010
    Applicant: Hoozad Inc.
    Inventor: Patrick M. MAXTON
  • Patent number: 7253901
    Abstract: A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.
    Type: Grant
    Filed: January 23, 2002
    Date of Patent: August 7, 2007
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Gary R. Janik, Patrick M. Maxton
  • Patent number: 7202951
    Abstract: A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.
    Type: Grant
    Filed: October 28, 2004
    Date of Patent: April 10, 2007
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Gary R. Janik, Patrick M. Maxton
  • Patent number: 7190441
    Abstract: Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: March 13, 2007
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: James T. McWhirter, Liang-Guo Wang, Hidong Kwak, Haixing Zou, Dan Georgesco, Bernard Lautee, Jennming James Chen, Gary R. Janik, Patrick M. Maxton
  • Patent number: 6804003
    Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: October 12, 2004
    Assignee: KLA-Tencor Corporation
    Inventors: Haiming Wang, Patrick M. Maxton, Kenneth C. Johnson, Mehrdad Nikoonahad
  • Patent number: 6734968
    Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample.
    Type: Grant
    Filed: April 22, 1999
    Date of Patent: May 11, 2004
    Inventors: Haiming Wang, Patrick M. Maxton, Kenneth C. Johnson, Mehrdad Nikoonahad
  • Publication number: 20030137662
    Abstract: A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.
    Type: Application
    Filed: January 23, 2002
    Publication date: July 24, 2003
    Inventors: Gary R. Janik, Patrick M. Maxton