Patents by Inventor Patrick Mauchien

Patrick Mauchien has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7944558
    Abstract: A method for physicochemical analysis of a material during its ablation with a pulsed laser. The method uses the ratio of intensity levels of two emission lines of a tracer element derived from plasma generated by the laser beam to characterize the plasma excitation temperature. The method determines concentration of an element to be measured in the plasma using standard measurements indicating correspondence between a concentration of the element to measured and a variation of intensity of an emission line and different ratios between intensity levels of two emission lines of the tracer element, the ratios representing the plasma temperature.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: May 17, 2011
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Daniel L'Hermite, Patrick Mauchien, Jean-Luc Lacour
  • Publication number: 20080160618
    Abstract: A method for physicochemical analysis of a material during its ablation with a pulsed laser. The method uses the ratio of intensity levels of two emission lines of a tracer element derived from plasma generated by the laser beam to characterize the plasma excitation temperature. The method determines concentration of an element to be measured in the plasma using standard measurements indicating correspondence between a concentration of the element to measured and a variation of intensity of an emission line and different ratios between intensity levels of two emission lines of the tracer element, the ratios representing the plasma temperature.
    Type: Application
    Filed: February 22, 2006
    Publication date: July 3, 2008
    Applicant: Commissariat A L'energie Atomique
    Inventors: Daniel L'Hermite, Patrick Mauchien, Jean-Luc Lacour
  • Patent number: 7106439
    Abstract: This device comprises a pulsed laser source (6), means (8, 10, 12) for focusing light from this source onto an object to be analysed (2) to produce plasma on the surface of the object, means (16, 18) of analyzing a plasma radiation spectrum, means (20) of determining the elementary composition of the object from this analysis, and possibly means (4) for displacing the object. The invention is particularly applicable to test radioactive materials.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: September 12, 2006
    Assignee: Commissariat a l''Energie Atomique
    Inventors: Jean-Luc Lacour, Jean-François Wagner, Vincent Detalle, Patrick Mauchien
  • Publication number: 20050024638
    Abstract: This device comprises a pulsed laser source (6), means (8, 10, 12) for focusing light from this source onto an object to be analysed (2) to produce plasma on the surface of the object, means (16, 18) of analysing a plasma radiation spectrum, means (20) of determining the elementary composition of the object from this analysis, and possibly means (4) for displacing the object. The invention is particularly applicable to test radioactive materials.
    Type: Application
    Filed: September 1, 2004
    Publication date: February 3, 2005
    Inventors: Jean-Luc Lacour, Jean-Francois Wagner, Vincent Detalle, Patrick Mauchien
  • Patent number: 5627641
    Abstract: Isotopic analysis process by optical emission spectrometry on laser-produced plasma. According to the invention, the sample to be analyzed (10) is irradiated by a laser beam (20) to produce a plasma (13), the light spectrum emitted by said plasma is analyzed and from it is deduced the isotopic composition of the sample. Application to isotopic analysis in the nuclear industry.
    Type: Grant
    Filed: June 14, 1995
    Date of Patent: May 6, 1997
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Patrick Mauchien, Walter Pietsch, Alain Petit, Alain Briand
  • Patent number: 5583634
    Abstract: A process for simultaneously blowing a gas jet onto a sample 6 to be analyzed and subsequently focusing a laser beam 4 onto the sample so as to produce a plasma 12 on the surface of the sample. An analysis is made of the spectrum S' of the light radiation emitted by the plasma and this spectrum analysis provides the basis for determining the composition of the isotopic composition of the sample.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: December 10, 1996
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Nadine Andre, Patrick Mauchien, Alexandre Semerok
  • Patent number: 4641032
    Abstract: Process for the determination of traces of uranium in solution by the spectrofluorimetry method. The fluorescence of the uranium molecules in the solution is excited by a pulsed laser shot. The exponential decay curve of this fluorescence is studied for a given wavelength. The value F.sub.O of said same fluorescence is deduced at the end of each laser pulse and is compared with the value F'.sub.O obtained for a standard uranium solution and containing a known uranium quantity.
    Type: Grant
    Filed: March 15, 1985
    Date of Patent: February 3, 1987
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Patrick Mauchien, Philippe Cauchetier