Patents by Inventor Patrick Petrus Albertus Arnoldino Peeters

Patrick Petrus Albertus Arnoldino Peeters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
    Patent number: 10346729
    Abstract: A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation includes primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.
    Type: Grant
    Filed: November 13, 2012
    Date of Patent: July 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Marcel Bontekoe, Patrick Petrus Albertus Arnoldino Peeters
  • APPARATUS AND METHOD FOR CONVERTING A VECTOR-BASED REPRESENTATION OF A DESIRED DEVICE PATTERN FOR A LITHOGRAPHY APPARATUS, APPARATUS AND METHOD FOR PROVIDING DATA TO A PROGRAMMABLE PATTERNING DEVICE, A LITHOGRAPHY APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20140240732
    Abstract: A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation includes primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.
    Type: Application
    Filed: November 13, 2012
    Publication date: August 28, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Marcel Bontekoe, Patrick Petrus Albertus Arnoldino Peeters