Patents by Inventor Patrick Scheible
Patrick Scheible has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240123544Abstract: A method for welding at least two aluminum-containing components is provided. The components have an aluminum content of at least 75% by weight. The method includes subdividing an output laser beam into multiple partial beams directed onto the components, so that multiple laser spots are generated on a surface of the components, and traversing a welding contour on the surface of the components with the multiple laser spots. Laser spot centers of at least three laser spots of the multiple laser spots are arranged in a ring formation. The output laser beam is generated by a multifiber, so that each laser spot of the multiple laser spots on the surface of the components has a core portion and a ring portion, with a mean power density in the core portion being higher than a mean power density in the ring portion.Type: ApplicationFiled: December 22, 2023Publication date: April 18, 2024Inventors: Philipp Scheible, Patrick Haug, Jan Wildermuth
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Publication number: 20240123545Abstract: A method for welding at least two aluminum-containing components is provided. Each component has a content of at least 75% by weight of aluminium. The method includes subdividing an output laser beam into multiple partial beams directed onto the components such that multiple laser spots are generated on a surface of the components, and traversing a welding contour on the surface of the components with the multiple laser spots. Laser spot centers of at least three laser spots of the multiple laser spots are arranged in a ring formation. The output laser beam is generated by a multifiber such that each laser spot of the multiple laser spots on the surface of the components has a core portion and a ring portion. The welding contour is at least partially traversed by pivoting a first mirror in a controlled manner by a scanner optical unit.Type: ApplicationFiled: December 21, 2023Publication date: April 18, 2024Inventors: Patrick HAUG, Philipp SCHEIBLE, Nicolai SPEKER, Tim HESSE
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Patent number: 7489441Abstract: An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength ?0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.Type: GrantFiled: May 17, 2005Date of Patent: February 10, 2009Assignee: Carl Zeiss SMT AGInventors: Guenter Scheible, legal representative, Sigrid Scheible, legal representative, Harald Schink, Alexander Hirnet, Patrick Scheible
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Publication number: 20080297745Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: December 4, 2008Inventors: Karl-Stefan WEISSENRIEDER, Alexander HIRNET, Alexander PAZIDIS, Karl-Heinz SCHUSTER, Christoph ZACZEK, Michael LILL, Patrick SCHEIBLE, Guenter SCHEIBLE, Sigrid SCHEIBLE, Harald SCHINK, Markus BROTSACK, Ulrich LOERING, Toralf GRUNER
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Patent number: 7460206Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: GrantFiled: December 20, 2004Date of Patent: December 2, 2008Assignee: Carl Zeiss SMT AGInventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Guenter Scheible, legal representative, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Patrick Scheible
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Publication number: 20080291419Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: November 27, 2008Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Guenter Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Sigrid Scheible
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Publication number: 20080094599Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.Type: ApplicationFiled: June 3, 2005Publication date: April 24, 2008Applicant: CARL ZEISS SMT AGInventors: Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner, Hans-Juergen Rostalski, Wolfgang Singer
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Patent number: 7093937Abstract: An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (? max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.Type: GrantFiled: February 9, 2005Date of Patent: August 22, 2006Assignee: Carl Zeiss SMT AGInventors: Harry Bauer, Matthias Heller, Hans-Jochen Paul, Jens Ullmann, Patrick Scheible, Christoph Zaczek
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Publication number: 20050286827Abstract: An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength ?0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.Type: ApplicationFiled: May 17, 2005Publication date: December 29, 2005Inventors: Patrick Scheible, Guenter Scheible, Sigrid Scheible, Harald Schink, Alexander Hirnet
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Publication number: 20050225737Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: December 20, 2004Publication date: October 13, 2005Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Guenter Scheible
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Publication number: 20050146683Abstract: An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (? max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.Type: ApplicationFiled: February 9, 2005Publication date: July 7, 2005Inventors: Harry Bauer, Matthias Heller, Hans-Jochen Paul, Jens Ullmann, Patrick Scheible, Christoph Zaczek
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Patent number: 6863398Abstract: A method for coating substrates (10) for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (? max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.Type: GrantFiled: September 17, 2002Date of Patent: March 8, 2005Assignee: Carl Zeiss SMT AGInventors: Harry Bauer, Matthias Heller, Hans-Jochen Paul, Jens Ullmann, Patrick Scheible, Christoph Zaczek
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Publication number: 20030082298Abstract: A method for coating substrates (10) for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (&bgr;max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.Type: ApplicationFiled: September 17, 2002Publication date: May 1, 2003Applicant: CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AGInventors: Harry Bauer, Matthias Heller, Hans-Jochen Paul, Jens Ullmann, Patrick Scheible, Christoph Zaczek