Patents by Inventor Patrick Speno

Patrick Speno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Critical dimension control of printed features using non-printing fill patterns
    Patent number: 7074525
    Abstract: Non-uniformity and image shortening are substantially reduced in an image printed on a substrate using a photolithographic mask in which the mask pattern includes at least one lines and spaces array adjacent to at least one clear region. At least one line feature is incorporated within the clear region of the mask pattern and is disposed in proximity to the lines and spaces array. The line feature has a line width that is smaller than a minimum resolution of the optical projection system. The image is printed by illuminating the photolithographic mask and projecting light transmitted through the photolithographic mask onto the substrate using the optical projection system.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: July 11, 2006
    Assignees: Infineon Technologies AG, International Business Machines Corporation
    Inventors: Chung-Hsi J. Wu, Timothy Allan Brunner, Shahid Butt, Patrick Speno
  • Critical dimension control of printed features using non-printing fill patterns
    Publication number: 20040219435
    Abstract: Non-uniformity and image shortening are substantially reduced in an image printed on a substrate using a photolithographic mask in which the mask pattern includes at least one lines and spaces array adjacent to at least one clear region. At least one line feature is incorporated within the clear region of the mask pattern and is disposed in proximity to the lines and spaces array. The line feature has a line width that is smaller than a minimum resolution of the optical projection system. The image is printed by illuminating the photolithographic mask and projecting light transmitted through the photolithographic mask onto the substrate using the optical projection system.
    Type: Application
    Filed: April 29, 2003
    Publication date: November 4, 2004
    Applicants: Infineon Technologies North America Corp., International Business Machines Corporation
    Inventors: Chung-Hsi J. Wu, Timothy Allan Brunner, Shahid Butt, Patrick Speno