Patents by Inventor Patrick Taylor Shower

Patrick Taylor Shower has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Erosion resistant coatings applied by variable bias cathodic arc deposition
    Patent number: 12559845
    Abstract: A cathodic arc coating system includes alternating layers of at least one of titanium vanadium nitride (TiVN) and titanium silicon vanadium nitride (TiSiVN) disposed on a substrate; and alternating layers of titanium vanadium chromium nitride (TiVCrN) and titanium silicon vanadium nitride (TiSiVCrN) disposed on a substrate. A cathodic arc process includes a sub-hertz variable bias forming the alternating layers of alternating layers of at least one of titanium vanadium nitride (TiVN) and titanium silicon vanadium nitride (TiSiVN) disposed on a substrate; and alternating layers of titanium vanadium chromium nitride (TiVCrN) and titanium silicon vanadium nitride (TiSiVCrN) disposed on a substrate.
    Type: Grant
    Filed: November 10, 2022
    Date of Patent: February 24, 2026
    Assignee: GE Infrastructure Technology LLC
    Inventors: Scott Andrew Weaver, Joshua Roger Salisbury, Aida Amroussia, Jon Michael Wilcox, Patrick Taylor Shower
  • EROSION RESISTANT COATINGS APPLIED BY VARIABLE BIAS CATHODIC ARC DEPOSITION
    Publication number: 20240158922
    Abstract: A cathodic arc coating system includes alternating layers of at least one of titanium vanadium nitride (TiVN) and titanium silicon vanadium nitride (TiSiVN) disposed on a substrate; and alternating layers of titanium vanadium chromium nitride (TiVCrN) and titanium silicon vanadium nitride (TiSiVCrN) disposed on a substrate. A cathodic arc process includes a sub-hertz variable bias forming the alternating layers of alternating layers of at least one of titanium vanadium nitride (TiVN) and titanium silicon vanadium nitride (TiSiVN) disposed on a substrate; and alternating layers of titanium vanadium chromium nitride (TiVCrN) and titanium silicon vanadium nitride (TiSiVCrN) disposed on a substrate.
    Type: Application
    Filed: November 10, 2022
    Publication date: May 16, 2024
    Inventors: Scott Andrew Weaver, Joshua Roger Salisbury, Aida Amroussia, Jon Michael Wilcox, Patrick Taylor Shower