Patents by Inventor Patrick W. Shaw

Patrick W. Shaw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shift of circuit periphery layout to leverage optimal use of available metal tracks in periphery logic
    Patent number: 10747931
    Abstract: Systems, apparatuses, and methods for efficiently floor planning a semiconductor chip are disclosed. Within either the processor or the memory of a computing system, each of a first block and a neighboring second block has a same height. A first metal track plan for the first block is unaligned with respect to a second metal track plan for the second block. An offset for moving each track of the second metal plan to align with a track of the first metal track plan is determined where the offset is a fraction of the height. The placement of the second block is shifted by the offset with respect to the first block. The shifted placement of the second block allows the first metal track plan for the first block to use a unidirectional pattern across the first block and the second block.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: August 18, 2020
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Keith Kasprak, Patrick W. Shaw
  • SHIFT OF CIRCUIT PERIPHERY LAYOUT TO LEVERAGE OPTIMAL USE OF AVAILABLE METAL TRACKS IN PERIPHERY LOGIC
    Publication number: 20190034572
    Abstract: Systems, apparatuses, and methods for efficiently floor planning a semiconductor chip are disclosed. Within either the processor or the memory of a computing system, each of a first block and a neighboring second block has a same height. A first metal track plan for the first block is unaligned with respect to a second metal track plan for the second block. An offset for moving each track of the second metal plan to align with a track of the first metal track plan is determined where the offset is a fraction of the height. The placement of the second block is shifted by the offset with respect to the first block. The shifted placement of the second block allows the first metal track plan for the first block to use a unidirectional pattern across the first block and the second block.
    Type: Application
    Filed: July 28, 2017
    Publication date: January 31, 2019
    Inventors: Keith Kasprak, Patrick W. Shaw