Patents by Inventor Patrick W. Vaughn

Patrick W. Vaughn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for focusing a wafer stepper
    Patent number: 5049925
    Abstract: A reticle for use in a wafer stepper of the type in which a lens projects the image of a mask to create a lithographically-defined pattern on a wafer. The reticle includes a plurality of parallel, opaque rectangles formed therein. The rectangles are uniform in size with the width of each rectangle bearing a ratio to the distance between adjacent rectangles of approximately 4:1.
    Type: Grant
    Filed: April 20, 1990
    Date of Patent: September 17, 1991
    Assignee: Micron Technology, Inc.
    Inventors: John Aiton, Patrick W. Vaughn, Eugene DeLarosa