Patents by Inventor Patty Hui-ing Tsai

Patty Hui-ing Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon and polycide plasma etch appplications by use of silicon-containing compounds
    Patent number: 5863839
    Abstract: During the etching of a silicon-containing material using a halogen-containing etch gas, a silicon-hydride gas is added to the etch gas to provide increased sidewall protection during the etch. Suitably up to about 50 percent by volume of a silicon-containing gas such as silane is added to improve anisotropy of the etch and to prevent notching at the silicon-substrate interface.
    Type: Grant
    Filed: June 27, 1997
    Date of Patent: January 26, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Dale A. Olson, Xue-Yu Qian, Patty Hui-ing Tsai
  • Etching silicon-containing materials by use of silicon-containing compounds
    Patent number: 5705433
    Abstract: During the etching of a silicon-containing material using a halogen-containing etch gas, a silicon-hydride gas is added to the etch gas to provide increased sidewall protection during the etch. Suitably up to about 50 percent by volume of a silicon-containing gas such as silane is added to improve anisotropy of the etch and to prevent notching at the silicon-substrate interface.
    Type: Grant
    Filed: August 24, 1995
    Date of Patent: January 6, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Dale A. Olson, Xue-Yu Qian, Patty Hui-ing Tsai