Abstract: A laser processing head can be used for joining (e.g., welding, brazing, soldering, etc.) workpieces. A collimator collimates laser light, which passes to a beam splitter. The beam splitter has anti-reflective and high-reflective coatings on peripheral and inner areas of the beam splitter. The beam splitter splits the collimated light into central or inner light from the inner area and peripheral light from the peripheral area. A main output in communication with the beam splitter directs at least the peripheral light into a main beam toward the workpieces. For example, a cable can feed a brazing wire adjacent the main beam for brazing the workpieces together. Meanwhile, a secondary output in communication with the beam splitter directs at least the central light into a secondary beam, which can be used to pre-heat the workpiece, post-heat the workpiece, or remove any surface coating from the workpiece.

Abstract: In one example, system includes a source for providing a laser beam and a collimator including a plurality of lenses positioned along a beam path of the laser beam. At least one lens of the plurality of the lenses is transversely movable relative to the laser beam path to induce angular movement or deflection of the laser beam. The collimator is positioned in the beam path and is structured such that the laser beam at the at least one lens has a reduced diameter relative to the diameter of the laser beam exiting the collimator. The systems disclosed herein may be used in connection with systems for laser cutting a component, laser machining a component, or laser welding or otherwise joining two or more components with a laser, amongst other variations.

Abstract: A laser processing head for a laser beam uses actuators engaged with a delivery fiber end to deflect the fiber end relative to an optical axis. The laser beam from the fiber end is collimated by a collimator and is then focused by a focusing lens disposed in the head beyond the collimator to a focal point. The focal point of the laser beam is deflected from the optical axis in relation to the deflection of the fiber end. The fiber end and the actuators are housed in a sealed module. Deflection of the laser beam can be sensed by reflecting portion of the laser beam to a sensing element so a control system can monitor and control the fiber end's movement.

Abstract: An exposure apparatus and printed wafer such that a design is printed within a peripheral portion of the wafer. The peripheral portion of the wafer is between an outer boundary of an active portion of the wafer and an outer boundary of the wafer. The exposure apparatus comprises a lens, a reticle that includes a pattern, and a reticle blind. The reticle blind blocks a first portion of light that is passed through the exposure apparatus. A transparent portion of the reticle transmits a remaining portion of the light. The lens focuses the remaining portion of the light onto the wafer such that an image of a portion of the pattern is printed as the design within the peripheral portion of the wafer. The printed design is a function of where the reticle blind is positioned relative to the pattern.

Abstract: Disclosed are a method and system for calibrating grid parameters for a photolithographic tool. One embodiment of the invention utilizes at least two artifacts located on the wafer stage. The artifacts are located outside of the area where a substrate would be placed. Typically, four artifacts are used, with two artifacts located along the same axis. The stage moves a first artifact to the alignment system and the system measures the location of the first artifact. The stage then moves the second artifact, which is on the same axis but on the other side of the wafer stage, under the alignment system and measures the location of the second artifact. This is repeated for the other two artifacts that line up in a second axis (i.e., perpendicular to the first axis). Grid offsets are calculated to provide, for example, grid magnification and rotation calibrations.

Abstract: The present invention is a system and method for use with alignment marks and search algorithms of diffraction pattern detection tools. The system and method of the invention significantly increases the capture range of diffraction pattern detection methods and enable more efficient operation of tools employing such detection methods.

Abstract: Robust alignment marks which are substantially resistant to degradation caused by semiconductor device fabrication steps are disclosed. The new alignment marks use a series of geometrical shapes that are staggered in respect to each other to achieve more left and right edges providing a checkerboard alignment mark. The geometrical shapes have a size that is selected so as to be within the resolving capability of the exposure tool, yet smaller than the resolving capability of the alignment system. The small staggered geometrical shapes provide a more symmetrical signal which is more resistant to variability in prior processing steps than the standard mark design.

Abstract: Robust alignment marks which are substantially resistant to degradation caused by semiconductor device fabrication steps are disclosed. The new alignment marks use a series of geometrical shapes that are staggered in respect to each other to achieve more left and right edges providing a checkerboard alignment mark. The geometrical shapes have a size that is selected so as to be within the resolving capability of the exposure tool, yet smaller than the resolving capability of the alignment system. The small staggered geometrical shapes provide a more symmetrical signal which is more resistant to variability in prior processing steps than the standard mark design.

Abstract: Industrial scissors having one handle formed with a ring through which fingers may be inserted and the other handle formed with an elongated arched bar having a convex surface against which a palm may be snugly seated and pressed.