Patents by Inventor Paul Alexander VERMEULEN

Paul Alexander VERMEULEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240116760
    Abstract: A carbon nanotube membrane including carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, wherein the carbon nanotube membrane has a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles including carbon based membranes, lithographic apparatuses includes carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.
    Type: Application
    Filed: February 3, 2022
    Publication date: April 11, 2024
    Inventors: Paul Alexander VERMEULEN, Zomer Silvester HOUWELING
  • Publication number: 20230314930
    Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
    Type: Application
    Filed: July 29, 2021
    Publication date: October 5, 2023
    Inventors: Vadim Yevgenyevich BANINE, Paul Alexander VERMEULEN, Cornelis Adrianus DE MEIJERE, Johnnes Hubertus Josephina MOORS, Andrey NIKIPELOV, Guido SALMASO, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
  • Publication number: 20230168577
    Abstract: An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.
    Type: Application
    Filed: April 21, 2021
    Publication date: June 1, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Zomer Silvester HOUWELING, Volker Dirk HILDENBRAND, Alexander Ludwig KLEIN, Paul Alexander VERMEULEN
  • Publication number: 20220276553
    Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
    Type: Application
    Filed: August 20, 2020
    Publication date: September 1, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Sander BALTUSSEN, Vadim Yevgenyevich BANINE, Alexandr DOLGOV, DONMEZ NOYAN, Zomer Silvester HOUWELING, Arnoud Willem NOTENBOOM, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Paul Alexander VERMEULEN, David Ferdinand VLES, Victoria VORONINA, Halil Gökay YEGEN