Patents by Inventor Paul Allan Daniel

Paul Allan Daniel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6891173
    Abstract: Systems and methods that neutralize ion beams in implantation processes are provided. The methods involve introducing a gas into the ion beam. The gas, for example, can be introduced into a region defined by an electrode through which the ion beam travels. The gas increases the generation of electrons in the beam which, in turn, neutralizes the beam. The neutralized beam has a reduced tendency to diverge (i.e., greater beam stability) during transport which can increase the beam current delivered to the wafer and implant uniformity, amongst other advantages. The systems and methods are particularly useful in limiting the divergence of low energy ion beams.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: May 10, 2005
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: George Gammel, Paul Allan Daniel
  • Publication number: 20030080301
    Abstract: Systems and methods that neutralize ion beams in implantation processes are provided. The methods involve introducing a gas into the ion beam. The gas, for example, can be introduced into a region defined by an electrode through which the ion beam travels. The gas increases the generation of electrons in the beam which, in turn, neutralizes the beam. The neutralized beam has a reduced tendency to diverge (i.e., greater beam stability) during transport which can increase the beam current delivered to the wafer and implant uniformity, amongst other advantages. The systems and methods are particularly useful in limiting the divergence of low energy ion beams.
    Type: Application
    Filed: October 26, 2001
    Publication date: May 1, 2003
    Inventors: George Gammel, Paul Allan Daniel