Patents by Inventor Paul Aoyagi
Paul Aoyagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11156548Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.Type: GrantFiled: March 28, 2018Date of Patent: October 26, 2021Assignee: KLA-Tencor CorporationInventors: Manh Nguyen, Phillip Atkins, Alexander Kuznetsov, Liequan Lee, Natalia Malkova, Paul Aoyagi, Mikhail Sushchik, Dawei Hu, Houssam Chouaib
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Patent number: 10481088Abstract: Automatic determination of Fourier harmonic order for computation of spectral information for diffraction structures described. An embodiment of a method includes automatically determining a Fourier harmonic order for computation of spectral information for periodic structures, wherein the determination of the Fourier harmonic order is based at least in part on the pitches in each of multiple directions of the periodic structures, material properties of the periodic structures, and characteristics of the periodic structures in which the materials are contained; and computing the spectral information for the periodic structures based at least in part on the determined Fourier harmonic order.Type: GrantFiled: June 2, 2014Date of Patent: November 19, 2019Assignee: KLA-TENCOR CORPORATIONInventors: Mark Backues, Paul Aoyagi, Leonid Poslavsky
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Publication number: 20190178788Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.Type: ApplicationFiled: March 28, 2018Publication date: June 13, 2019Inventors: Manh Nguyen, Phillip Atkins, Alexander Kuznetsov, Liequan Lee, Natalia Malkova, Paul Aoyagi, Mikhail Sushchik, Dawei Hu, Houssam Chouaib
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Patent number: 9470639Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to grating anomalies are presented herein. A reduction in sensitivity to grating anomalies is achieved by selecting a subset of available system parameter values for measurement analysis. The reduction in sensitivity to grating anomalies enables an optimization of any combination of precision, sensitivity, accuracy, system matching, and computational effort. These benefits are particularly evident in optical metrology systems having large ranges of available azimuth angle, angle of incidence, illumination wavelength, and illumination polarization. Predictions of grating anomalies are determined based on a measurement model that accurately represents the interaction between the measurement system and the periodic metrology target under measurement. A subset of available system parameter values is selected to reduce the impact of grating anomalies on measurement results.Type: GrantFiled: February 3, 2016Date of Patent: October 18, 2016Assignee: KLA-Tencor CorporationInventors: Guorong V. Zhuang, Shankar Krishnan, Lanhua Wei, Walter Mieher, Paul Aoyagi
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Patent number: 9127927Abstract: Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.Type: GrantFiled: December 12, 2012Date of Patent: September 8, 2015Assignee: KLA-Tencor CorporationInventors: Jonathan Iloreta, Paul Aoyagi, Hanyou Chu, Jeffrey Chard, Peilin Jiang, Mikhail Sushchik, Leonid Poslavsky, Philip D. Flanner, III
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Publication number: 20140358476Abstract: Automatic determination of Fourier harmonic order for computation of spectral information for diffraction structures described. An embodiment of a method includes automatically determining a Fourier harmonic order for computation of spectral information for periodic structures, wherein the determination of the Fourier harmonic order is based at least in part on the pitches in each of multiple directions of the periodic structures, material properties of the periodic structures, and characteristics of the periodic structures in which the materials are contained; and computing the spectral information for the periodic structures based at least in part on the determined Fourier harmonic order.Type: ApplicationFiled: June 2, 2014Publication date: December 4, 2014Inventors: Mark Backues, Paul Aoyagi, Leonid Poslavsky
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Publication number: 20130158948Abstract: Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.Type: ApplicationFiled: December 12, 2012Publication date: June 20, 2013Inventors: Jonathan Iloreta, Paul Aoyagi, Hanyou Chu, Jeffrey Chard, Peilin Jiang, Mikhail Sushchik, Leonid Poslavsky, Phillip D. Flanner, III
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Patent number: 7760358Abstract: The above and other needs are met by a method of determining actual properties of a film stack by directing an incident beam of light towards the film stack, such that the incident beam of light is reflected from the film stack as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the film stack are estimated. A mathematical model of the film stack is solved with the estimated properties of the film stack, to yield theoretical properties of the reflected beam of light. The mathematical model is solved in part using a fast Z-matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light, to yield a cost function. The estimated properties of the film stack are iteratively adjusted, and the mathematical model is iteratively solved, until the cost function is within a desired tolerance.Type: GrantFiled: February 1, 2007Date of Patent: July 20, 2010Assignee: KLA-Tencor CorporationInventors: Paul Aoyagi, Leonid Poslavsky
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Patent number: 7375828Abstract: A method of determining actual properties of layered media. An incident beam of light is directed towards the layered media, such that the incident beam of light is reflected from the layered media as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the layered media are estimated. A mathematical model of the layered media based on a modal function expansion is solved with the estimated properties of the layered media to yield theoretical properties of the reflected beam of light. The eigenvalues of the modal functions are computed recursively by recasting the eigenvalue equation in the following form: ?ni+1=F(?ni) where ?ni=the eigenvalue of the ith recursion and F is a function such that ?n=F(?n) is mathematically identical to the eigenvalue equation.Type: GrantFiled: May 25, 2005Date of Patent: May 20, 2008Assignee: KLA-Tencor CorporationInventors: Paul Aoyagi, Leonid Poslavsky
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Patent number: 7362686Abstract: A method of determining actual properties of layered media. An incident beam of light is directed towards the layered media, such that the incident beam of light is reflected from the layered media as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the layered media are estimated. A mathematical model of the layered media is solved with the estimated properties of the layered media to yield theoretical properties of the reflected beam of light. The mathematical model is solved using a diagonal T matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the layered media are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance. The estimated properties of the layered media are reported as the actual properties of the layered media.Type: GrantFiled: December 1, 2004Date of Patent: April 22, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Paul Aoyagi, Philip D. Flanner, III, Leonid Poslavsky
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Patent number: 7345761Abstract: A method of determining actual properties of layered media. An incident beam of light is directed towards the layered media, such that the incident beam of light is reflected from the layered media as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the layered media are estimated. A mathematical model of the layered media is solved with the estimated properties of the layered media to yield theoretical properties of the reflected beam of light. The mathematical model is solved using at least one of a modified T matrix algorithm and a Z matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the layered media are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance.Type: GrantFiled: September 20, 2004Date of Patent: March 18, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Paul Aoyagi, Philip D. Flanner, III, Leonid Poslavsky
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Patent number: 7190453Abstract: A method of determining the actual properties of a film stack. An incident beam of light is directed towards the film stack, such that the incident beam of light is reflected from the film stack as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the film stack are estimated. A mathematical model of the film stack is solved with the estimated properties of the film stack to yield theoretical properties of the reflected beam of light. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the film stack are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance. The estimated properties of the film stack are reported as the actual properties of the film stack.Type: GrantFiled: September 20, 2004Date of Patent: March 13, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Paul Aoyagi, Philip D. Flanner, III, Leonid Poslavsky