Patents by Inventor Paul Blom

Paul Blom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning apparatus and immersion lithographic apparatus
    Publication number: 20090174870
    Abstract: A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the cleaning apparatus to clean a surface is also disclosed. The immersion lithographic apparatus may comprise a substrate table to support a substrate and a fluid confinement structure to at least partly confine immersion fluid between a projection system and a substrate table and/or substrate.
    Type: Application
    Filed: October 30, 2008
    Publication date: July 9, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paul Blom, Ronald Harm Gunther Kramer, Michel van Putten, Ariel de Graaf