Abstract: A power supply unit for a plasma plant, in particular for a plasma spraying plant, comprises an isolating transformer for connection to three-phase mains, a current control array and a rectifier array. The rectifier array comprises silicon wafer thyristors in a three-phase bridge configuration, which thyristors are electronically controlled through a current control loop, and an exterior voltage control loop is provided for additional electronic control of the silicon wafer thyristors.In the output from the thyristor array, a filter with a transient voltage suppressor may be provided as high-frequency protection and with di/dt limitation.