Abstract: An exemplary apparatus, according to an exemplary embodiment of the present disclosure, can include, for example, a uterine manipulator having a clamp arrangement having a first tip(s) and a second tip(s), and a colpotomy ring arrangement coupled to the clamp arrangement on or at the first tip(s), and including an opening(s) in an outer surface thereof for insertion of the second tip(s) therethrough when the clamp arrangement is in a closed position. In some exemplary embodiments of the present disclosure, the clamp arrangement can include a uterine manipulator. The first tip(s) can include a plurality of removable tips, where each of the tips can have a different length from one another. In certain exemplary embodiments of the present disclosure, the first tip(s) can have a variable length.

Abstract: The present invention provides, in various embodiments, systems and methods for robotic manipulation of a patient's anatomy, such as the uterus, during surgical procedures.

Abstract: The present invention provides, in various embodiments, systems and methods for robotic manipulation of a patient's anatomy, such as the uterus, during minimally invasive surgical procedures.

Abstract: An ocular prosthesis includes a display device visible at an anterior portion of the ocular prosthesis. The display device is configured to present a changeable image that represents a natural appearance and movement for a visible portion of an eyeball of a subject. A system includes, besides the ocular prosthesis, an implant marker configured to move with an orbital implant disposed in an eye socket of a subject. A method includes determining a change in orientation of an orbital implant in a subject and determining an update to a natural appearance for a visible portion of an eyeball for the subject based on the change in orientation of the orbital implant. The method also includes rendering an update to an image of the natural appearance for a display device disposed in an ocular prosthesis configured to be inserted in the subject anterior to the orbital implant.

Abstract: The present invention provides, in various embodiments, systems and methods for robotic manipulation of a patient's anatomy, such as the uterus, during minimally invasive surgical procedures.

Abstract: An ocular prosthesis includes a display device visible at an anterior portion of the ocular prosthesis. The display device is configured to present a changeable image that represents a natural appearance and movement for a visible portion of an eyeball of a subject. A system includes, besides the ocular prosthesis, an implant marker configured to move with an orbital implant disposed in an eye socket of a subject. A method includes determining a change in orientation of an orbital implant in a subject and determining an update to a natural appearance for a visible portion of an eyeball for the subject based on the change in orientation of the orbital implant. The method also includes rendering an update to an image of the natural appearance for a display device disposed in an ocular prosthesis configured to be inserted in the subject anterior to the orbital implant.

Abstract: The invention relates to a circuit (100) able to achieve simultaneous impedance matching between a generator (G) and a load (CH) for a power supply signal comprising at least two distinct frequencies.

Abstract: A method for generating an ion flow asymmetry in a capacitively coupled radiofrequency plasma reactor comprising a step for energization of a first electrode by a radiofrequency voltage waveform. The standardized voltage waveform is an approximate waveform with a degree of approximation of a standardized sawtooth radiofrequency function having different rising and falling slopes. The degree of approximation of the approximate waveform and the pressure P of the gas are sufficiently high for causing the appearance of an asymmetry of the ion flows between the ion flow at the first electrode and the ion flow at a second electrode.

Abstract: An exemplary apparatus, according to an exemplary embodiment of the present disclosure, can include, for example, a uterine manipulator having a clamp arrangement having a first tip(s) and a second tip(s), and a colpotomy ring arrangement coupled to the clamp arrangement on or at the first tip(s), and including an opening(s) in an outer surface thereof for insertion of the second tip(s) therethrough when the clamp arrangement is in a closed position. In some exemplary embodiments of the present disclosure, the clamp arrangement can include a uterine manipulator. The first tip(s) can include a plurality of removable tips, where each of the tips can have a different length from one another. In certain exemplary embodiments of the present disclosure, the first tip(s) can have a variable length.

Abstract: A submersible mixing and sampling apparatus with submersible supply systems (12, 14) for first and second liquid components such as a thermoset resin and a curing agent is disclosed. Each supply system has a respective submersible tank (24) for holding a respective one of the liquid components. Submersible mixers (46, 48, 50) downstream of the supply systems mix the liquid components underwater to form a curable mixture for injection into a subsea chamber such as a tee (102). Submersible sampling devices downstream of the mixers take samples (94) of the mixture underwater before, during and after injection, and optionally also at the surface. The samples may be cured and tested underwater or may be lifted to the surface for testing. The apparatus may be mounted on a subsea skid (100) or basket.

Abstract: A subsea drying system (10) for drying a chamber (12) underwater has an upstream piping (24, 26, 28) for conveying a pressurized drying fluid from a source (18) to the chamber (12); and downstream piping (36, 38, 40) for expelling liquid displaced from the chamber (12) by the drying fluid in an open-loop dewatering mode. In a closed-loop dehumidifying mode, a recirculation path (54) between the downstream piping (36, 38, 40) and the upstream piping (24, 26, 28) conveys drying fluid exiting the chamber (12) back into the chamber (12) after passing through a dehumidifier (58). A valve system selectively closes and opens the re-circulation path to expel displaced liquid when that path is closed and to recirculate drying fluid from the chamber (12) through the dehumidifier (58) to the upstream piping (24, 26, 28) when that path is open.

Abstract: A submersible mixing and sampling apparatus with submersible supply systems (12, 14) for first and second liquid components such as a thermoset resin and a curing agent is disclosed. Each supply system has a respective submersible tank (24) for holding a respective one of the liquid components. Submersible mixers (46, 48, 50) downstream of the supply systems mix the liquid components underwater to form a curable mixture for injection into a subsea chamber such as a tee (102). Submersible sampling devices downstream of the mixers take samples (94) of the mixture underwater before, during and after injection, and optionally also at the surface. The samples may be cured and tested underwater or may be lifted to the surface for testing. The apparatus may be mounted on a subsea skid (100) or basket.

Abstract: A subsea drying system (10) for drying a chamber (12) underwater has an upstream piping (24, 26, 28) for conveying a pressurized drying fluid from a source (18) to the chamber (12); and downstream piping (36, 38, 40) for expelling liquid displaced from the chamber (12) by the drying fluid in an open-loop dewatering mode. In a closed-loop dehumidifying mode, a recirculation path (54) between the downstream piping (36, 38, 40) and the upstream piping (24, 26, 28) conveys drying fluid exiting the chamber (12) back into the chamber (12) after passing through a dehumidifier (58). A valve system selectively closes and opens the re-circulation path to expel displaced liquid when that path is closed and to recirculate drying fluid from the chamber (12) through the dehumidifier (58) to the upstream piping (24, 26, 28) when that path is open.

Abstract: A method for generating an ion flow asymmetry in a capactively coupled radiofrequency plasma reactor comprising a step for energization of a first electrode by a radiofrequency voltage waveform. The standardized voltage waveform is an approximate waveform with a degree of approximation of a standardized sawtooth radiofrequency function having different rising and falling slopes. The degree of approximation of the approximate waveform and the pressure P of the gas are sufficiently high for causing the appearance of an asymmetry of the ion flows between the ion flow at the first electrode and the ion flow at a second electrode.

Abstract: An ocular prosthesis includes a display device visible at an anterior portion of the ocular prosthesis. The display device is configured to present a changeable image that represents a natural appearance and movement for a visible portion of an eyeball of a subject. A system includes, besides the ocular prosthesis, an implant marker configured to move with an orbital implant disposed in an eye socket of a subject. A method includes determining a change in orientation of an orbital implant in a subject and determining an update to a natural appearance for a visible portion of an eyeball for the subject based on the change in orientation of the orbital implant. The method also includes rendering an update to an image of the natural appearance for a display device disposed in an ocular prosthesis configured to be inserted in the subject anterior to the orbital implant.

Abstract: A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The method includes collecting a set of process data, the process data including a set of induced current signals flowing through a measuring capacitor. The method further includes converting the set of induced current signals into a set of analog voltage signals and converting the set of analog voltage signals into a set of digital signals. The method also includes analyzing the set of digital signals to detect high frequency perturbations, the high frequency perturbations indicating the plasma instability.

Abstract: A processing system for detecting in-situ arcing events during substrate processing is provided. The processing systems includes at least a plasma processing chamber having a probe arrangement, wherein the probe arrangement is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The probe arrangement also includes a detection arrangement that is coupled to a second plate of the measuring capacitor, wherein the detection arrangement is configured for converting an induced current flowing through the measuring capacitor into a set of digital signals, which is processed to detect the in-situ arcing events.

Abstract: A matching circuit is provided to adapt electrical impedance simultaneously for at least one pair of a higher and a lower frequencies between a plasma reactor and a generator; said matching circuit comprises at least a “load and tune” L-type stage, and includes a “tune circuit” connected in series to the plasma reactor and having at least one of or both an inductor and a capacitor in series; a “load circuit” connected in parallel to the series-connected “tune circuit” and load, and comprising at least one of or both an inductor and a capacitor in parallel; and the component values of the tune and load circuits are chosen such that, for the lower frequency, the matching circuit follows a negative load reactance path in a Smith chart, and for the higher frequency, the matching circuit follows a positive load reactance path in the Smith chart.

Abstract: A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.

Abstract: A system includes a probe arranged in a plasma processing chamber of the plasma processing system. A capacitor has one end connected to the probe. An RF source is configured to selectively supply an RF signal including RF bursts to another end of the capacitor. A plasma characterizing computing device is configured to collect a set of process data from the probe by measuring current supplied to the capacitor and voltage at the capacitor; identify a relevancy range for the set of process data, wherein the relevancy range includes process data collected after the capacitor begins discharging and before the capacitor is fully discharged; determine a set of seed values based on the process data in the relevancy range; and employ the relevancy range and the set of seed values as initial values for curve fitting corresponding to the one of the RF bursts to reduce a number of curve-fitting iterations.