Abstract: A remote administration system is described herein that provides varying permissions to invoke administrative commands to multiple users. An application host provisions users of different organizations and defines one or more commands that the users can invoke remotely. The system associates the commands with users and/or groups to specify the users and/or groups that are authorized to execute the commands. When the remote administration system receives a remote request to perform a command, the system determines a user associated with the command and whether the user is authorized to execute the command. The system also creates an execution context for each connected user that defines the roles and access privileges associated with the user and that isolates the user from other users. Thus, the remote administration system provides remote administration of hosted applications in a way that is easy for administrators of the hosted service to manage.

Abstract: Multistep recycling processes for preparing recycled plastic materials. The processes feature a sequence of operations selected from the group consisting of preprocessing operations, size reduction operations, gravity concentration operations, color sorting, sorting by thickness, friction, or differential terminal velocity or drag in air, surface to mass control operations, separation processes enhanced by narrow surface to mass distributions, blending operations, and extrusion and compounding operations. Plastic-rich mixtures are subjected to the process, and one or more recycled plastic materials are collected as outputs of the sequence of processes.

Abstract: A multiple beam generator for use in a scanning system, wherein the generator includes an acousto-optic deflector (AOD) which during use receives a laser beam and generates a deflected beam, the deflection of which is determined by an AOD control signal; a diffractive element which generates an array of input beams from the deflected beam; and a control circuit which during operation generates the AOD control signal and varies a characteristic of the first control signal to account for errors in the scanning system.

Abstract: A transportable system for separating materials in a waste stream. An arrangement of separation and grinding devices is mounted on a transportable platform. The devices are configured and arranged to produce three or more product streams from a plastic-rich feed mixture. One of the product streams is a coarse heavy stream, one stream is a ground plastic-rich product stream, and one stream is a ground light material stream. The system can be transported to a waste-goods location, operated to separate waste-goods, and relocated a new location.

Abstract: An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.

Abstract: A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock signal having a variable period that compensates for the non-uniformity of pixel velocity. The wide separation of scan beams permits the modulator to turn beams on or off with a direction of brightening or darkening in the cross-section of the beams being opposite to the scanning direction. A novel arrangement of the beams in the brush permits a uniform indexing step size to uniformly expose an image region.

Abstract: The present invention provides a source of multiple beams of electrons having a desired spatial pattern, as typically used for multiple beam lithography. A source of radiation, typically ultraviolet radiation, is directed onto a modulator and from the modulator onto a photocathode. The modulator, typically a spatial light modulator, imposes a spatial pattern onto the radiation. The pattern imposed onto the radiation is transmitted to the multiple beams of electrons as such beams are generated by the photocathode. An electron beam lithography system having higher throughput than conventional single beam systems is one result. Methods of creating multiple electron beams and methods of patterning targets with such multiple beams of electrons are also described. A micromirror array is a preferred modulator. Mercury arc lamp directing ultraviolet radiation by means of the modulator onto a cesium telluride photocathode is a preferred combination of radiation source and photocathode.

Abstract: An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.

Abstract: A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock signal having a variable period that compensates for the non-uniformity of pixel velocity. The wide separation of scan beams permits the modulator to turn beams on or off with a direction of brightening or darkening in the cross-section of the beams being opposite to the scanning direction. A novel arrangement of the beams in the brush permits a uniform indexing step size to uniformly expose an image region.

Abstract: A transportable system for separating materials in a waste stream. An arrangement of separation and grinding devices is mounted on a transportable platform. The devices are configured and arranged to produce three or more product streams from a plastic-rich feed mixture. One of the product streams is a coarse heavy stream, one stream is a ground plastic-rich product stream, and one stream is a ground light material stream. The system can be transported to a waste-goods location, operated to separate waste-goods, and relocated a new location.

Abstract: In a method of registering an image on a substrate, the substrate is placed on a substrate support and a radiation beam is directed toward the substrate. The radiation beam is reflectively diffracted to modulate the intensity of the radiation beam. The modulated radiation beam is scanned across the substrate to register an image on the substrate. In one version, the radiation beam is a laser beam which is projected onto a mask blank to form a mask.

Abstract: A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock signal having a variable period that compensates for the non-uniformity of pixel velocity. The wide separation of scan beams permits the modulator to turn beams on or off with a direction of brightening or darkening in the cross-section of the beams being opposite to the scanning direction. A novel arrangement of the beams in the brush permits a uniform indexing step size to uniformly expose an image region.

Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.

Abstract: In a method of registering an image on a substrate, the substrate is placed on a substrate support and a radiation beam is directed toward the substrate. The radiation beam is reflectively diffracted to modulate the intensity of the radiation beam. The modulated radiation beam is scanned across the substrate to register an image on the substrate. In one version, the radiation beam is a laser beam which is projected onto a mask blank to form a mask.

Abstract: An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.

Abstract: An image registration apparatus has a substrate support capable of supporting a substrate, the substrate support having a support motor capable of moving the substrate support. A radiation beam source is provided that is capable of providing a radiation beam. A beam intensity modulator is also provided that has an adjustable reflective diffraction grating capable of reflectively diffracting the radiation beam to modulate the intensity of the radiation beam. A controller is also provided that is adapted to control the substrate support, radiation beam source, and beam intensity modulator to modulate and scan the radiation beam across the substrate to register an image on the substrate.

Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.

Abstract: A lithography apparatus including both a laser beam source and an electron beam column, where the electron beam column has a support(in one embodiment a window in the column housing) having an index of refraction n. The support, having a photocathode source material disposed on its remote surface, is located in some embodiments such that the internal angle of the incident laser beam is &thgr; with respect to a line perpendicular to the remote surface. The numerical aperture of the substrate(equal to nsin &thgr;) is greater than one in one embodiment, resulting in a high resolution spot size diameter incident on the photocathode source material at the remote surface. Incident energy from the laser beam thereby emits a corresponding high resolution electron beam from the photocathode source material. Electromagnetic lens components are disposed downstream in the electron beam column to demagnify the electron beam.

Abstract: An acousto-optic modulator for use with a multi-channel laser beam system, for instance, is of conventional structure except that two different RF (radio frequency) signals drive the modulator. These signals each produce at least one output beam as diffracted by the modulator body. These two beams are angularly and spatially separated. One of the sets of beams is incident upon a beam stop, and therefore is not used for writing. Only the other set of beams, driven by the other of the frequencies, performs the actual writing. The optical stop in addition to blocking one of the sets of diffracted beams also blocks the transmission of the zero order (undiffracted) beam. The sum of the load power of the signals at the two frequencies is kept approximately constant, thereby maintaining a constant thermal condition within the modulator.

Abstract: A precision printing system uses multiple scan beams that an acousto-optic modulator (AOM) separately modulates. An array of optical elements such as dove prisms separately rotates each of the beams about a central ray of the beam to eliminate blurred edges, skew, and variations in line thickness caused by the direction of propagation of acoustic waves in the AOM being at an angle to a scan direction. In particular, the amount of rotation is selected so that in the final image the direction in which illumination progresses across a cross-section of a beam is in a direction opposite the scan direction. A method of making the array includes attaching rods to a flat, grinding or polishing the combination of the rods and flat to form three planar regions that correspond to facets on prisms. Removing the rods/prisms from the flat. Using photolithography and etching to form grooves in a substrate, and a mounting the rods/prisms in the grooves on the substrate.