Patents by Inventor Paul Chhabra

Paul Chhabra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ampoule for liquid draw and vapor draw with a continuous level sensor
    Patent number: 7775508
    Abstract: A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: August 17, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Kenric T. Choi, Pravin K. Narwankar, Shreyas S. Kher, Son T. Nguyen, Paul Deaton, Khai Ngo, Paul Chhabra, Alan H. Ouye, Dien-Yeh (Daniel) Wu
  • AMPOULE FOR LIQUID DRAW AND VAPOR DRAW WITH A CONTINOUS LEVEL SENSOR
    Publication number: 20080099933
    Abstract: A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.
    Type: Application
    Filed: October 31, 2006
    Publication date: May 1, 2008
    Inventors: Kenric T. Choi, Pravin K. Narwankar, Shreyas S. Kher, Son T. Nguyen, Paul Deaton, Khai Ngo, Paul Chhabra, Alan H. Ouye, Dien-Yeh (Daniel) Wu