Patents by Inventor Paul Christiaans

Paul Christiaans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10732514
    Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.
    Type: Grant
    Filed: February 1, 2019
    Date of Patent: August 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Seyed Iman Mossavat, Paul Christiaan Hinnen
  • Publication number: 20200186932
    Abstract: A balanced armature receiver is disclosed that includes a housing and an armature assembly within the housing. The armature assembly includes a first armature portion and a second armature portion. The first armature portion and the second armature portion are operated such that the second armature portion is substantially unstable relative to the first armature portion.
    Type: Application
    Filed: February 19, 2020
    Publication date: June 11, 2020
    Inventors: Aart Zeger Van Halteren, Paul Christiaan Van Hal, Hamidreza Taghavi, Andreas Tiefenau, Wouter Bruins
  • Publication number: 20200185281
    Abstract: A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.
    Type: Application
    Filed: February 14, 2020
    Publication date: June 11, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard MC NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER
  • Publication number: 20200124968
    Abstract: A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
    Type: Application
    Filed: December 20, 2019
    Publication date: April 23, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Mark John Maslow, Frank Staals, Paul Christiaan Hinnen
  • Publication number: 20200126872
    Abstract: A method of determining overlay of a patterning process, the method including: obtaining a detected representation of radiation redirected by one or more physical instances of a unit cell, wherein the unit cell has geometric symmetry at a nominal value of overlay and wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the one or more physical instances of the unit cell; and determining, from optical characteristic values from the detected radiation representation, a value of a first overlay for the unit cell separately from a second overlay for the unit cell that is also obtainable from the same optical characteristic values, wherein the first overlay is in a different direction than the second overlay or between a different combination of parts of the unit cell than the second overlay.
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard MC NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER
  • Publication number: 20200110342
    Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shift (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.
    Type: Application
    Filed: October 7, 2019
    Publication date: April 9, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Zili ZHOU, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar, Elliott Gerard MC Namara, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Murat Bozkurt, Joost Jeroen Ottens, Kaustuve Bhattacharyya
  • Patent number: 10615084
    Abstract: A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: April 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
  • Publication number: 20200085326
    Abstract: An assembly of at least one radiation detector, at least one radiation emitter and a housing configured to be positioned inside the ear canal of a person or animal, the detector(s) and emitter(s) being provided in or on the housing, the emitter(s) being configured to emit radiation away from the housing and the detector(s) being configured to receive radiation directed toward the housing. No overlap may be provided between the field of view of the radiation detector(s) and the emitter(s), such as by providing a blocking element.
    Type: Application
    Filed: August 23, 2019
    Publication date: March 19, 2020
    Inventors: Alwin Fransen, Nicolaas Maria Jozef Stoffels, Paul Christiaan van Hal, Sietse Jacob van Reeuwijk, Raymond Mögelin
  • Publication number: 20200073254
    Abstract: A substrate has first and second target structures formed thereon by a lithographic process. Each target structure has two-dimensional periodic structure formed in a single material layer on a substrate using first and second lithographic steps, wherein, in the first target structure, features defined in the second lithographic step are displaced relative to features defined in the first lithographic step by a first bias amount that is close to one half of a spatial period of the features formed in the first lithographic step, and, in the second target structure, features defined in the second lithographic step are displaced relative to features defined in the first lithographic step by a second bias amount close to one half of said spatial period and different to the first bias amount.
    Type: Application
    Filed: November 6, 2019
    Publication date: March 5, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Maurits VAN DER SCHAAR, Youping ZHANG, Hendrik Jan Hidde SMILDE, Anagnostis TSIATMAS, Adriaan Johan VAN LEEST, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER, Paul Christiaan HINNEN
  • Patent number: 10582303
    Abstract: A balanced armature receiver is disclosed that includes a housing and an armature assembly within the housing. The armature assembly includes a first armature portion and a second armature portion. The first armature portion and the second armature portion are operated such that the second armature portion is substantially unstable relative to the first armature portion.
    Type: Grant
    Filed: December 1, 2016
    Date of Patent: March 3, 2020
    Assignee: SONION NEDERLAND B.V.
    Inventors: Aart Zeger van Halteren, Paul Christiaan van Hal, Hamidreza Taghavi, Andreas Tiefenau, Wouter Bruins
  • Patent number: 10571806
    Abstract: A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Mark John Maslow, Frank Staals, Paul Christiaan Hinnen
  • Patent number: 10546790
    Abstract: A method of determining overlay of a patterning process, the method including: obtaining a detected representation of radiation redirected by one or more physical instances of a unit cell, wherein the unit cell has geometric symmetry at a nominal value of overlay and wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the one or more physical instances of the unit cell; and determining, from optical characteristic values from the detected radiation representation, a value of a first overlay for the unit cell separately from a second overlay for the unit cell that is also obtainable from the same optical characteristic values, wherein the first overlay is in a different direction than the second overlay or between a different combination of parts of the unit cell than the second overlay.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: January 28, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
  • Publication number: 20200013685
    Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.
    Type: Application
    Filed: September 17, 2019
    Publication date: January 9, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMA, Paul Christiaan HINNEN, Elliott Gerard McNAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER
  • Patent number: 10488768
    Abstract: A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: November 26, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bastiaan Onne Fagginger Auer, Paul Christiaan Hinnen, Hugo Augustinus Joseph Cramer, Anagnostis Tsiatmas, Mariya Vyacheslavivna Medvedyeva
  • Patent number: 10481503
    Abstract: A substrate has first and second target structures formed by a lithographic process. Each target structure has a two-dimensional periodic structure formed in a single layer using first and second lithographic steps. The first target structure has features defined in the second lithographic step displaced relative to features defined in the first lithographic step by a first bias amount. The second target structure has features defined in the second lithographic step displaced relative to features defined in the first lithographic step by a second bias amount. An angle-resolved scatter spectrum of the first target structure and an angle-resolved scatter spectrum of the second target structure is obtained. A measurement of a parameter of a lithographic process is derived from the measurements using asymmetry found in the scatter spectra of the first and second target structures.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: November 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer, Paul Christiaan Hinnen
  • Patent number: 10474039
    Abstract: A lithographic apparatus (LA) prints product features and at least one focus metrology pattern (T) on a substrate. The focus metrology pattern is defined by a reflective reticle and printing is performed using EUV radiation (404) incident at an oblique angle (?). The focus metrology pattern comprises a periodic array of groups of first features (422). A spacing (S1) between adjacent groups of first features is much greater than a dimension (CD) of the first features within each group. Due to the oblique illumination, the printed first features become distorted and/or displaced as a function of focus error. Second features 424 may be provided as a reference against which displacement of the first features may be seen. Measurement of this distortion and/or displacement may be by measuring asymmetry as a property of the printed pattern. Measurement can be done at longer wavelengths, for example in the range 350-800 nm.
    Type: Grant
    Filed: December 19, 2016
    Date of Patent: November 12, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Paul Christiaan Hinnen, Simon Gijsbert Josephus Mathijssen, Maikel Robert Goosen, Maurits Van Der Schaar, Arie Jeffrey Den Boef
  • Patent number: 10453758
    Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer
  • Publication number: 20190268709
    Abstract: An assembly of a receiver and a microphone, such as for positioning in an ear canal of a person. The receiver and microphone are provided in an overlapping relationship to take up less space while being able to emit sound in one direction and receive sound from that direction. When the assembly if for use deep inside the ear canal of a person, the microphone may be very small, as it is exposed to very high sound levels.
    Type: Application
    Filed: February 25, 2019
    Publication date: August 29, 2019
    Inventors: Alwin Fransen, Nicolaas Maria Jozef Stoffels, Paul Christiaan van Hal, Sietse Jacob van Reeuwijk, Raymond Mögelin
  • Patent number: 10394137
    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
  • Publication number: 20190258177
    Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.
    Type: Application
    Filed: February 1, 2019
    Publication date: August 22, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph CRAMER, Seyed Iman Mossavat, Paul Christiaan Hinnen