Abstract: A processing machine (10) for building an object (11) from powder (12) includes a build platform (26A); a powder supply assembly (18) that deposits the powder (12) onto the build platform (26A) to form a powder layer (13); and an energy system (22) that directs an energy beam (22D) at a portion of the powder (12) on the build platform (26A) to form a portion of the object (11). The powder supply assembly (18) can include (i) a powder container (640A) that retains the powder (12); (ii) a supply outlet (639) positioned over the build platform (26A); and (ii) a flow control assembly (642) that selectively controls the flow of the powder (12) from the supply outlet (639).

Abstract: A processing machine (10) for building an object (11) from material (12) includes (i) a material bed assembly (16) that supports the material (12); (ii) a material supply assembly (18) that positions the material (12); (iii) an energy system (22) that directs an energy beam (22A) at the material (12) to build the object (11); (iv) a housing assembly (24) that defines at least a portion of a build chamber (29) for the energy beam (22A), the housing assembly (24) being spaced apart a housing gap (30A) from the material (12); and (v) a seal assembly (26) that creates a housing seal (26A) between the housing assembly (24) and the material (12) to seal the housing gap (30A).

Abstract: 3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.

Abstract: To improve the operation of 3D printing systems, techniques are disclosed for a rotary 3D printer comprising: a main rotating support table rotating about a first axis and one or more secondary support tables rotating around a non-coaxial secondary axis; a powder supply assembly for distributing powder onto the tables; and an energy system for directing an energy beam at the powder to form a part. The main support table and secondary support tables can rotate in the same or opposite directions. Disclosed techniques include: grooved support table surfaces for improving stability of applied powder; reciprocating bellows for controlling a differential load on actuators that move the support tables; high temperature bearings or bushings for supporting rotary motion at high temperatures; and a mechanism for counterbalancing a weight of the part being built.

Abstract: A processing machine (10) for building a three-dimensional object (11) from a material (12) includes a support platform (26A), a platform mover (30), a build bed (28), a bed mover (28C), and an energy system (22). The platform mover (30) moves the support platform (26A) in a platform rotation direction (30C) at a first angular velocity. The build bed (28) is movably coupled to the support platform (26A). The build bed (28) supports at least a portion of the material (12). The bed mover (28C) rotates the build bed (28) relative to the support platform (26A) in a bed rotation direction (28D) at a second angular velocity. The bed rotation direction (28D) is opposite to the platform rotation direction (30C), and the second angular velocity is one-half the first angular velocity. The energy system (22) directs an energy beam (22B) at the material (12) on the build bed (28) to form at least a portion of the object (11).

Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.

Abstract: A processing machine (10) for building a part (11) includes: a support device (26) including a support surface (26B); a drive device (28) which moves the support device (26) so as a specific position on the support surface (26B) is moved along a moving direction (25); a powder supply device (18) which supplies a powder (12) to the moving support device (26) to form a powder layer (13); an irradiation device (22) which irradiates at least a portion of the powder layer (13) with an energy beam (22D) to form at least a portion of the part (11) from the powder layer (13) during a first period of time; and a measurement device (20) which measures at least portion of the part (11) during a second period of time. The first period in which the irradiation device (22) irradiates the powder layer (13) with the energy beam (22D) and the second period in which the measurement device (22) measures are overlapped.

Abstract: A measuring device (233) for monitoring movement of a first object relative to a second object, the first object or the second object including a target surface (13), comprises a first image sensor combination (236), a second image sensor combination (237), and a control system (20A). The image sensor combinations (236, 237) capture first images and second images of the target surface (13) over time. The first image sensor combination (236) includes a first image sensor (236A) and a first lens assembly (236B). The second image sensor combination (237) includes a second image sensor (237A), and a second lens assembly (237B) having a second optical axis (237BX) that is at an angle of between thirty degrees and sixty degrees relative to normal to the target surface (13). The control system (20A) analyzes the first images and the second images to monitor movement of the first object relative to the second object.

Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.

Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.

Abstract: An exposure apparatus (10) for transferring one or more features to a workpiece (22) includes an illumination source (44A); (ii) a chuck (40) that retains the workpiece (22); (iii) a chamber housing (28A) that encircles the chuck and the workpiece; and (iv) a temperature controller (32) (34) that adjusts the temperature of at least one of the chuck (40) and the workpiece (22) so that a predetermined temperature differential (309) exists between the chuck (40) and the workpiece (22) before transferring the features to the workpiece (22).

Abstract: An exposure apparatus for transferring a pattern from a reticle to a workpiece, a pellicle being positioned near the reticle, includes a heat transfer frame, an illuminator, and a temperature controller. The heat transfer frame is configured to be positioned near the pellicle, the heat transfer frame defining a beam aperture. The illuminator directs a beam through the beam aperture and the pellicle at the reticle. The temperature controller controls the temperature of the heat transfer frame to control the temperature of the pellicle. The illuminator can direct the beam from a beam source, such as an EUV beam source. Additionally, the temperature controller can cryogenically cool the heat transfer frame.

Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.

Abstract: An exposure apparatus (10) for transferring one or more features to a workpiece (22) includes an illumination source (44A); (ii) a chuck (40) that retains the workpiece (22); (iii) a chamber housing (28A) that encircles the chuck and the workpiece; and (iv) a temperature controller (32) (34) that adjusts the temperature of at least one of the chuck (40) and the workpiece (22) so that a predetermined temperature differential (309) exists between the chuck (40) and the workpiece (22) before transferring the features to the workpiece (22).

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: A measuring device (233) for monitoring movement of a first object relative to a second object, the first object or the second object including a target surface (13), comprises a first image sensor combination (236), a second image sensor combination (237), and a control system (20A). The image sensor combinations (236, 237) capture first images and second images of the target surface (13) over time. The first image sensor combination (236) includes a first image sensor (236A) and a first lens assembly (236B). The second image sensor combination (237) includes a second image sensor (237A), and a second lens assembly (237B) having a second optical axis (237BX) that is at an angle of between thirty degrees and sixty degrees relative to normal to the target surface (13). The control system (20A) analyzes the first images and the second images to monitor movement of the first object relative to the second object.

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.