Patents by Inventor Paul E. Cade

Paul E. Cade has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4724043
    Abstract: A method for forming a master mold for optical storage disks includes thermally growing an oxide or nitride layer on a semiconductor wafer. The thermally grown layer is then coated with a photoresist. The photoresist is exposed to a laser beam to form a data pattern and developed. The oxide or nitride under the developed pattern is etched and the photoresist stripped to provide a semiconductor master mold for optical disks.
    Type: Grant
    Filed: December 24, 1986
    Date of Patent: February 9, 1988
    Assignee: International Business Machines Corporation
    Inventors: Albert S. Bergendahl, Paul E. Cade, Norman T. Gonnella, Francis S. Luecke, Kurt E. Petersen
  • Patent number: 4599792
    Abstract: A method for fabrication of a buried field shield in a semiconductor substrate. A seed substrate is prepared by depositing an epitaxial layer or a seed wafer and then depositing a heavily doped layer and a thin dielectric. The thin dielectric is patterned for contact holes and then a conductive field shield is deposited and patterned. A thick quartz layer is deposited over the field shield and dielectric. A mechanical substrate is anodically bonded to the quartz of the seed substrate and the original seed wafer is etched back to expose the epitaxial layer for further fabrication.
    Type: Grant
    Filed: June 15, 1984
    Date of Patent: July 15, 1986
    Assignee: International Business Machines Corporation
    Inventors: Paul E. Cade, Badih El-Kareh, Ick W. Kim
  • Patent number: 4534804
    Abstract: A laser beam is used to scribe an alignment mark on the back side of a lightly doped substrate of a silicon wafer containing an heavily doped internal layer. The wavelength of the laser beam is chosen such that it passes through the lightly doped substrate without absorption but is absorbed in the heavily doped internal layer to produce therein a defect which has the same position as the scribed alignment mark. Subsequent heating of the wafer causes the defect to migrate upwardly through a lightly doped epitaxial layer to the front side of the wafer and produce therein a visible mirror image of the scribed alignment mark.
    Type: Grant
    Filed: June 14, 1984
    Date of Patent: August 13, 1985
    Assignee: International Business Machines Corporation
    Inventor: Paul E. Cade
  • Patent number: 4356730
    Abstract: This describes a dual electrode electrostatically deflectable deformographic switch. The switch can be driven by co-incident voltages and can be made to retain and store information. The switch can be used either as a display or a memory and has a number of engineering advantages, for it is a direct drive display which does not need either vacuum envelopes or electron beam drives. Furthermore, greater efficiencies can be realized and no refresh is necessary since the switch will operate in a standby condition. Also only two voltage levels above ground, i.e., a write voltage and a standby voltage, are required. The switch will enable copiers to be directly driven by computers.The switch can also be used as an optical waveguide transmit/receive switch or an accelerometer.
    Type: Grant
    Filed: January 8, 1981
    Date of Patent: November 2, 1982
    Assignee: International Business Machines Corporation
    Inventor: Paul E. Cade
  • Patent number: 4157560
    Abstract: A smaller, faster, more efficient photo detector cell can be created with improved photo sensitivity in the short wavelength regions, using well known integrated circuit production techniques, by forming the photo sensitive junction of the device in an isolated region of a thin epitaxial layer overlying a thin subcollector so as to use all the current generated in the cell. The cell thus comprises a semiconductor body having an epitaxial layer thereon which is divided into isolated pockets containing a photosensitive junction overlying a subcollector region formed at a depth of less than 10 microns between the substrate and the epitaxial layer. The photo sensitive junction of the device merges with the isolation region so that a single continuous P-N junction surrounds substantially all subcollectors and the isolated pocket of epitaxial material. A device constructed as taught realizes approximately 100% quantum efficiency over a wide range of incident light.
    Type: Grant
    Filed: December 30, 1977
    Date of Patent: June 5, 1979
    Assignee: International Business Machines Corporation
    Inventor: Paul E. Cade