Patents by Inventor Paul E. Nixon

Paul E. Nixon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process using dry etchant to avoid mask-and-etch cycle
    Patent number: 4624739
    Abstract: A process is disclosed for simultaneously etching holes in both the thick and thin portions of a dielectric layer on a semiconductor substrate. An anisotropic dry etchant is used to eliminate any significant lateral etching of the dielectric layer during etching. Thus, a mask-and-etch cycle may be eliminated from processing during integrated circuit manufacture, yet dimensional tolerances are maintained.
    Type: Grant
    Filed: August 9, 1985
    Date of Patent: November 25, 1986
    Assignee: International Business Machines Corporation
    Inventors: Paul E. Nixon, Murty S. Polavarapu, David Stanasolovich