Abstract: The present invention relates to implementation of magnetic and electrostatic forces to guide ions along curved trajectories in an ion source such that macroparticles are separated from the ion stream. Magnetic and electrostatic fields act in concert with the present invention to cause ions to flow along curved trajectories from the arc source to an area where workpieces may be treated. Since macroparticles produced by consumable electrode sources are much less affected by magnetic and electrostatic fields, said macroparticles are able to be separated from the ion stream due to the curved trajectories followed by the ions. The present invention permits effective macroparticle filtering by incorporating a consumable electrode material that faces away from the workpieces and to a closed end of the ion source. This filtering technique allows separation of macroparticles from the ion stream without substantially compromising deposition area, deposition rate, ion transport efficiency and/or uniformity in coating.

Abstract: The present invention relates to implementation of magnetic and electrostatic forces to guide ions along curved trajectories in an ion source such that macroparticles are separated from the ion stream. Magnetic and electrostatic fields act in concert with the present invention to cause ions to flow along curved trajectories from the arc source to an area where workpieces may be treated. Since macroparticles produced by consumable electrode sources are much less affected by magnetic and electrostatic fields, said macroparticles are able to be separated from the ion stream due to the curved trajectories followed by the ions. The present invention permits effective macroparticle filtering by incorporating a consumable electrode material that faces away from the workpieces and to a closed end of the ion source. This filtering technique allows separation of macroparticles from the ion stream without substantially compromising deposition area, deposition rate, ion transport efficiency and/or uniformity in coating.

Abstract: The present invention provides a plasma enhancement method and apparatus for electric arc vapor deposition. The plasma enhancement apparatus is positioned to act upon plasma generated from a plasma source before the plasma reaches a substrate to be coated by the plasma. The plasma enhancement apparatus includes a magnet disposed about a magnet axis and defining a first aperture, and a core member disposed about a core member axis and at least partially nested within the first aperture. The core member defines a second aperture, and the plasma enhancement apparatus is arranged and configured in such a manner that the evaporated cathode source material passes from the cathode source and through the second aperture toward the substrate to be coated by the evaporated cathode source material. The plasma is favorably conditioned as it passes through the plasma enhancement apparatus.

Abstract: The present invention provides a plasma enhancement method and apparatus for electric arc vapor deposition. The plasma enhancement apparatus is positioned to act upon plasma generated from a plasma source before the plasma reaches a substrate to be coated by the plasma. The plasma enhancement apparatus includes a magnet disposed about a magnet axis and defining a first aperture, and a core member disposed about a core member axis and at least partially nested within the first aperture. The core member defines a second aperture, and the plasma enhancement apparatus is arranged and configured in such a manner that the evaporated cathode source material passes from the cathode source and through the second aperture toward the substrate to be coated by the evaporated cathode source material. The plasma is favorably conditioned as it passes through the plasma enhancement apparatus.