Abstract: Some embodiments are directed to a method of determining a sintering thermal impedance of a sintering layer by: providing a substrate having a predetermined substrate thermal impedance and disposing the sintering layer on the substrate forming with the sintering layer a stack. Placing at least one semiconductor die, that includes a semiconductor element with at least two element electrodes on the sintering layer. Injecting an electrical current through the at least two element electrodes for measuring a temperature sensitive parameter of the semiconductor element. Heating the stack with a predetermined heat power and determining, while sintering, a semiconductor element temperature from the measured temperature sensitive parameter.

Abstract: A method of determining a sintering thermal impedance of a sintering layer (25) comprising: providing a substrate (20) having a predetermined substrate thermal impedance, disposing the sintering layer (25) on the substrate (20) forming with the sintering layer (25) a stack, placing at least one semiconductor die (30) comprising a semiconductor element (40) with at least two element electrodes (45; 47) on the sintering layer (25), injecting an electrical current through the at least two element electrodes (45; 47) for measuring a temperature sensitive parameter of the semiconductor element (40), heating the stack with a predetermined heat power, determining, while sintering, a semiconductor element temperature from the measured temperature sensitive parameter, measuring a stack temperature, determining a stack thermal impedance by subtracting the semiconductor element temperature from the stack temperature and dividing by the predetermined heat power, and subtracting the predetermined substrate thermal impedan