Patents by Inventor Paul F. Lyman

Paul F. Lyman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing high dielectric insulator for integrated circuit
    Patent number: 6624093
    Abstract: A high dielectric insulator for integrated circuit use is produced by depositing hafnium on a silicon dioxide surface of a silicon wafer and then promoting a solid-state reaction between the silicon dioxide and the hafnium by heating the wafer to produce hafnium silicate.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: September 23, 2003
    Assignee: WiSys Technology Foundation
    Inventors: Paul F. Lyman, Harry T. Johnson-Steigelman