Patents by Inventor Paul F. Nealey

Paul F. Nealey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230036175
    Abstract: Methods of spatially directing the orientation and placement of multiple block copolymer (BCP) domains on isolated regions of a substrate are described. The methods involve epitaxially directing the assembly of BCP domains using spatial boundaries between regions with different surface composition, formed at the edges of isolated chemical regions on a background chemistry. Multiple vertical domains of BCP order on the isolated region, self-aligned in a direction parallel to edges of the isolated region. In some embodiments, vertical domains order on multiple isolated regions of a first chemistry of a chemical contrast pattern with horizontal domains on the regions of a second (background) chemistry of the chemical contrast pattern. Also provided herein are compositions resulting from the methods.
    Type: Application
    Filed: December 22, 2020
    Publication date: February 2, 2023
    Inventors: Michael Arnold, Robert Jacobberger, Paul F. Nealey, Shisheng Xiong, Tzu-Hsuan Chang, Zhenqiang Ma
  • Patent number: 10438626
    Abstract: Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased. High density and quality nanoimprint templates and other nanopatterned structures are also provided.
    Type: Grant
    Filed: November 9, 2015
    Date of Patent: October 8, 2019
    Assignees: WISCONSIN ALUMNI RESEARCH FOUNDATION, WESTERN DIGITAL TECHNOLOGIES
    Inventors: Paul F. Nealey, Huiman Kang, Francois Detcheverry, Juan J. de Pablo, Ricardo Ruiz, Thomas Albrecht
  • Publication number: 20160133292
    Abstract: Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased. High density and quality nanoimprint templates and other nanopatterned structures are also provided.
    Type: Application
    Filed: November 9, 2015
    Publication date: May 12, 2016
    Inventors: Paul F. Nealey, Huiman Kang, Francois Detcheverry, Juan J. de Pablo, Ricardo Ruiz, Thomas Albrecht
  • Patent number: 9299381
    Abstract: Provided herein are block copolymer thin film structures and methods of fabrication. Aspects described herein include methods of directed self-assembly of block copolymers on patterns using solvent annealing, and the resulting thin films, structures, media or other compositions. According to various embodiments, solvent annealing is used direct the assembly of block copolymers on chemical patterns to achieve high degrees of pattern perfection, placement of features at the precision of the lithographic tool used to make the chemical pattern, improved dimensional control of features, improved line edge and line width roughness, and resolution enhancement by factors of two to four or greater.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: March 29, 2016
    Assignee: WISCONSIN ALUMNI RESEARCH FOUNDATION
    Inventors: Paul F. Nealey, Lei Wan
  • Patent number: 9181403
    Abstract: The present invention provides block copolymers comprising at least one covalent polymer block and at least one supramolecular polymer block, processes for their preparations and uses thereof.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: November 10, 2015
    Assignees: WISCONSIN ALUMNI RESEARCH FOUNDATION, YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM, LTD.
    Inventors: Roy Shenhar, Paul F. Nealey, Marcus Müller, Kostas Daoulas
  • Publication number: 20150239184
    Abstract: In one embodiment, a system for solvent annealing of a block copolymer film includes a solvent annealing chamber, and a controller configured to control at least one processing parameter for inducing a super-saturation of a solvent in an atmosphere within the solvent annealing chamber. In another embodiment, a method for solvent annealing of a block copolymer film includes inducing a super-saturation of a solvent in an atmosphere within a solvent annealing chamber having a block copolymer film therein for inducing formation of polymeric domains.
    Type: Application
    Filed: February 21, 2014
    Publication date: August 27, 2015
    Applicants: University of Chicago, HGST Netherlands B.V.
    Inventors: Yves-Andre Chapuis, Ricardo Ruiz, Lei Wan, Paul F. Nealey, Shisheng Xiong
  • Publication number: 20130109805
    Abstract: The present invention provides block copolymers comprising at least one covalent polymer block and at least one supramolecular polymer block, processes for their preparations and uses thereof.
    Type: Application
    Filed: August 30, 2012
    Publication date: May 2, 2013
    Applicants: Wisconsin Alumni Research Foundation, Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.
    Inventors: Roy Shenhar, Paul F. Nealey, Marcus Müller, Kostas Daoulas
  • Patent number: 8287957
    Abstract: The present invention provides improved and compositions methods for replicating substrate patterns including patterns containing irregular features. The methods of the invention involve depositing block copolymer materials on a patterned substrate and ordering components in the material to replicate the pattern. In some embodiments, ordering is facilitated through the use of blends of the copolymer material and/or configuring substrate patterns so that regions of the substrate pattern interact in a highly preferential manner with at least one of the components in the copolymer material. The invention also provides compositions containing a substrate pattern with irregular features replicated in a block copolymer material.
    Type: Grant
    Filed: November 22, 2005
    Date of Patent: October 16, 2012
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul F. Nealey, SangOuk Kim, Erik W. Edwards, Mark P. Stoykovich, Juan J. de Pablo
  • Patent number: 7851252
    Abstract: The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and/or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and/or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: December 14, 2010
    Assignee: Wisconsin Alumini Research Foundation
    Inventors: Paul F. Nealey, Tushar S. Jain, Erik W. Edwards, Juan Jose de Pablo
  • Patent number: 7807348
    Abstract: A method of imaging phenomena that occurs on a surface of a substrate includes contacting a fluid with a top surface of the substrate, and imaging phenomena that occurs on the top surface of the substrate by observing the substrate through polarized light in the absence of a liquid crystal after the liquid has contacted the top surface of the substrate. The top surface of the substrate has an anisotropic topography, and the wavelength of the polarized light is larger than the anisotropic topography of the top surface of the substrate.
    Type: Grant
    Filed: March 20, 2002
    Date of Patent: October 5, 2010
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Nicholas Lawrence Abbott, Paul F. Nealey
  • Publication number: 20090206054
    Abstract: The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and/or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and/or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.
    Type: Application
    Filed: February 17, 2009
    Publication date: August 20, 2009
    Applicant: Wisconsin Alumni Research Foundation
    Inventors: Paul F. Nealey, Tushar S. Jain, Erik W. Edwards, Juan J. de Pablo
  • Patent number: 7514764
    Abstract: The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and/or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and/or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: April 7, 2009
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul F Nealey, Tushar S. Jain, Erik W. Edwards, Juan J. de Pablo
  • Publication number: 20080187995
    Abstract: Surfaces, kits, and methods for the modulation of cell behavior in vitro by patterned nanoscale topography. The invention is particularly useful for providing means to affect and control the growth and differentiation of human embryonic stem cells.
    Type: Application
    Filed: September 25, 2007
    Publication date: August 7, 2008
    Inventors: Christopher J. Murphy, Paul F. Nealey, Daniel R. McFarlin, Sara J. Liliensiek, George A. McKie
  • Patent number: 7141176
    Abstract: Methods and apparatuses for assembling elements onto a substrate. The surfaces of the elements and/or the substrate are treated and the elements are dispensed over the substrate in a slurry. In one example of the invention, the substrate is exposed to a surface treatment fluid to create a surface on the substrate which has a selected one of a hydrophilic or a hydrophobic nature, and a slurry is dispensed over the substrate. The slurry includes a fluid and a plurality of elements (each of which includes a functional component). Each of the plurality of elements is designed to be received by a receptor region on the substrate. The dispensing of the slurry with the fluid occurs after the substrate is exposed to the surface treatment fluid, and the fluid is the selected one of a hydrophilic or a hydrophobic nature. In another example of the invention, a plurality of elements is exposed to a surface treatment fluid to create surfaces on the elements having a selected one of a hydrophilic or a hydrophobic nature.
    Type: Grant
    Filed: July 25, 2002
    Date of Patent: November 28, 2006
    Assignee: Alien Technology Corporation
    Inventors: John Stephen Smith, Mark A. Hadley, Gordon S. W. Craig, Paul F. Nealey
  • Patent number: 6926953
    Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.
    Type: Grant
    Filed: March 15, 2004
    Date of Patent: August 9, 2005
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
  • Publication number: 20040175628
    Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.
    Type: Application
    Filed: March 15, 2004
    Publication date: September 9, 2004
    Applicant: Wisconsin Alumni Research Foundation
    Inventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
  • Patent number: 6746825
    Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: June 8, 2004
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
  • Publication number: 20030180966
    Abstract: A method of imaging phenomena that occurs on a surface of a substrate includes contacting a fluid with a top surface of the substrate, and imaging phenomena that occurs on the top surface of the substrate by observing the substrate through polarized light in the absence of a liquid crystal after the liquid has contacted the top surface of the substrate. The top surface of the substrate has an anisotropic topography, and the wavelength of the polarized light is larger than the anisotropic topography of the top surface of the substrate.
    Type: Application
    Filed: March 20, 2002
    Publication date: September 25, 2003
    Applicant: Wisconsin Alumni Research Foundation
    Inventors: Nicholas Lawrence Abbott, Paul F. Nealey
  • Publication number: 20030091752
    Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.
    Type: Application
    Filed: October 5, 2001
    Publication date: May 15, 2003
    Inventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
  • Patent number: 6527964
    Abstract: Methods and apparatuses for assembling elements onto a substrate. The surfaces of the elements and/or the substrate are treated and the elements are dispensed over the substrate in a slurry. In one example of the invention, the substrate is exposed to a surface treatment fluid to create a surface on the substrate which has a selected one of a hydrophilic or a hydrophobic nature, and a slurry is dispensed over the substrate. The slurry includes a fluid and a plurality of elements (each of which includes a functional component). Each of the plurality of elements is designed to be received by a receptor region on the substrate. The dispensing of the slurry with the fluid occurs after the substrate is exposed to the surface treatment fluid, and the fluid is the selected one of a hydrophilic or a hydrophobic nature. In another example of the invention, a plurality of elements is exposed to a surface treatment fluid to create surfaces on the elements having a selected one of a hydrophilic or a hydrophobic nature.
    Type: Grant
    Filed: November 2, 1999
    Date of Patent: March 4, 2003
    Assignee: Alien Technology Corporation
    Inventors: John Stephen Smith, Mark A. Hadley, Gordon S. W. Craig, Paul F. Nealey