Patents by Inventor Paul Filseth

Paul Filseth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7264906
    Abstract: A method and system of optimizing the illumination of a mask in a photolithography process. A specific, preferred method includes the steps of: loading minimum design rules of a layout, loading exposure latitude constraints, loading mask error constraints, loading initial illumination conditions, simulating current illumination conditions, obtaining dose-to-print threshold from the minimum design rules (i.e., lines-and-space feature), applying OPC on the layout using the dose-to-print threshold, calculating DOF using the exposure latitude and mask error constraints, changing the illumination conditions in order to attempt to maximize common DOF with the exposure latitude and mask error constraints, and continuing the process until maximum common DOF is obtained.
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: September 4, 2007
    Assignee: LSI Corporation
    Inventors: Ebo H. Croffie, Nicholas K. Eib, Mario Garza, Paul Filseth, Lav D. Ivanovic
  • Patent number: 7171047
    Abstract: A computer-implemented method is disclosed for recognizing edges in a digital image having a plurality of pixels with gray-scale values defining features. The method includes recognizing edges of the features by cearting a new image in which pixels in the new image corresponding to pixels in the gray-scale image that have a brightness value meeting a predetermined threshold are assigned a first binary value to represent edge regions, while remaining pixels in the new image are assigned a second value to represent both background and internal areas of the features. Area recognition is then performed to distinguish internal feature areas from background areas. The method further includes detecting edge lines from the edge regions that separate features from background and internal feature areas.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: January 30, 2007
    Assignee: LSI Logic Corporation
    Inventors: Mikhail Grinchuk, Lav Ivanovic, Paul Filseth
  • Patent number: 7149340
    Abstract: A method and system for detecting defects in a physical mask used for fabricating a semiconductor device having multiple layers is disclosed, where each layer has a corresponding mask. The method and system include receiving a digital image of the mask, and automatically detecting edges of the mask in the image using pattern recognition. The detected edges, which are stored in a standard format, are imported along with processing parameters into a process simulator that generates an estimated aerial image of the silicon layout that would be produced by a scanner using the mask and the parameters. The estimated aerial image is then compared to an intended aerial image of the same layer, and any differences found that are greater than predefined tolerances are determined to horizontal defects. In addition, effects that the horizontal defects may have on adjacent layers are analyzed to discover vertical defects.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: December 12, 2006
    Assignee: LSI Logic Corporation
    Inventors: Paul Filseth, Neal Callan, Kunal Taravade, Mario Garza
  • Publication number: 20060105564
    Abstract: The present invention is directed to a method and system of intelligent dummy filling placement to reduce inter-layer capacitance caused by overlaps of dummy filling area on successive layers. The method and system treats each consecutive pair of layers together so as to minimize dummy filling overlaps between each layer. In particular, dummy fill features on each layer may be placed in a checkerboard pattern to avoid overlaps. As such, the present invention may eliminate large overlap area of the dummy patterns on consecutive layers by utilizing intelligent dummy filling placement.
    Type: Application
    Filed: November 17, 2004
    Publication date: May 18, 2006
    Inventors: Kunal Taravade, Neal Callan, Paul Filseth
  • Publication number: 20050196681
    Abstract: A method and system of optimizing the illumination of a mask in a photolithography process. A specific, preferred method includes the steps of: loading minimum design rules of a layout, loading exposure latitude constraints, loading mask error constraints, loading initial illumination conditions, simulating current illumination conditions, obtaining dose-to-print threshold from the minimum design rules (i.e., lines-and-space feature), applying OPC on the layout using the dose-to-print threshold, calculating DOF using the exposure latitude and mask error constraints, changing the illumination conditions in order to attempt to maximize common DOF with the exposure latitude and mask error constraints, and continuing the process until maximum common DOF is obtained.
    Type: Application
    Filed: March 5, 2004
    Publication date: September 8, 2005
    Inventors: Ebo Croffle, Nicholas Eib, Mario Garza, Paul Filseth, Lav Ivanovic
  • Patent number: 6868355
    Abstract: A method and system is provided for automatically calibrating a masking process simulator using a calibration mask and process parameters to produce a calibration pattern on a wafer. A digital image is created of the calibration pattern, and the edges of the pattern are detected. Data defining the calibration mask and at least one of the process parameters are input to a process simulator to produce an alim image estimating the calibration pattern that would be produced by the masking process. The alim image and the detected edges of the digital image are then overlaid, and a distance between contours of the pattern in the alim image and the detected edges is measured. One or more mathematical algorithms are used to iteratively change the values of the processing parameters until a set of processing parameter values are found that produces a minimum distance between the contours of the pattern in the alim image and the detected edges.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: March 15, 2005
    Assignee: LSI Logic Corporation
    Inventors: Lav Ivanovic, Paul Filseth, Mario Garza
  • Publication number: 20040199349
    Abstract: A method and system for automatically calibrating a masking process simulator are disclosed. The method and system include performing a masking process using a calibration mask and process parameters to produce a calibration pattern on a wafer. A digital image is created of the calibration pattern, and the edges of the pattern are detected from the digital image using pattern recognition. Data defining the calibration mask and the process parameters are then input to a process simulator to produce an alim image estimating the calibration pattern that would be produced by the masking process. The method and system further include overlaying the alim image and the detected edges of the digital image, and measuring a distance between contours of the pattern in the alim image and the detected edges.
    Type: Application
    Filed: April 20, 2004
    Publication date: October 7, 2004
    Inventors: Lav Ivanovic, Paul Filseth, Mario Garza
  • Patent number: 6782525
    Abstract: An improved process simulation system for simulating results of fabrication process for a semiconductor device design is disclosed. According to the method and system disclosed herein, the process simulator receives processing parameters and mask data for at least two masks as input, and simulates results of the fabrication process such that an aerial image is generated for each layer of the device that was simulated. After generating the aerial images, the process simulator superimposes the aerial images to create a composite image. An operator is then allowed to misalign at least one of the images in relation to the other images based on one or more offset values. The composite image showing the misalignment is then displayed, allowing the operator to view nominal process capability as well as process fluctuations prior to fabrication of the semiconductor device.
    Type: Grant
    Filed: September 5, 2002
    Date of Patent: August 24, 2004
    Assignee: LSI Logic Corporation
    Inventors: Mario Garza, Neal Callan, George Bailey, Travis Brist, Paul Filseth
  • Patent number: 6768958
    Abstract: A method and system for automatically calibrating a masking process simulator using a calibration mask and process parameters to produce a calibration pattern on a wafer. A digital image is created of the calibration pattern, and the edges of the pattern are detected. Data defining the calibration mask and the process parameters are input to a process simulator to produce an alim image estimating the calibration pattern that would be produced by the masking process. The alim image and the detected edges of the digital image are then overlaid, and a distance between contours of the pattern in the alim image and the detected edges is measured. One or more mathematical algorithms are used to iteratively change the values of the processing parameters until a set of processing parameter values are found that produces a minimum distance between the contours of the pattern in the alim image and the detected edges.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: July 27, 2004
    Assignee: LSI Logic Corporation
    Inventors: Lav Ivanovic, Paul Filseth, Mario Garza
  • Publication number: 20040120578
    Abstract: A computer-implemented method is disclosed for recognizing edges in a digital image having a plurality of pixels with gray-scale values defining features. The method includes recognizing edges of the features by cearting a new image in which pixels in the new image corresponding to pixels in the gray-scale image that have a brightness value meeting a predetermined threshold are assigned a first binary value to represent edge regions, while remaining pixels in the new image are assigned a second value to represent both background and internal areas of the features. Area recognition is then performed to distinguish internal feature areas from background areas. The method further includes detecting edge lines from the edge regions that separate features from background and internal feature areas.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Inventors: Mikhail Grinchuk, Lav Ivanovic, Paul Filseth
  • Publication number: 20040102912
    Abstract: A method and system for automatically calibrating a masking process simulator are disclosed. The method and system include performing a masking process using a calibration mask and process parameters to produce a calibration pattern on a wafer. A digital image is created of the calibration pattern, and the edges of the pattern are detected from the digital image using pattern recognition. Data defining the calibration mask and the process parameters are then input to a process simulator to produce an alim image estimating the calibration pattern that would be produced by the masking process. The method and system further include overlaying the alim image and the detected edges of the digital image, and measuring a distance between contours of the pattern in the alim image and the detected edges.
    Type: Application
    Filed: November 26, 2002
    Publication date: May 27, 2004
    Inventors: Lav Ivanovic, Paul Filseth, Marlo Garza
  • Publication number: 20040057610
    Abstract: A method and system for detecting defects in a physical mask used for fabricating a semiconductor device having multiple layers is disclosed, where each layer has a corresponding mask. The method and system include receiving a digital image of the mask, and automatically detecting edges of the mask in the image using pattern recognition. The detected edges, which are stored in a standard format, are imported along with processing parameters into a process simulator that generates an estimated aerial image of the silicon layout that would be produced by a scanner using the mask and the parameters. The estimated aerial image is then compared to an intended aerial image of the same layer, and any differences found that are greater than predefined tolerances are determined to horizontal defects. In addition, effects that the horizontal defects may have on adjacent layers are analyzed to discover vertical defects.
    Type: Application
    Filed: September 20, 2002
    Publication date: March 25, 2004
    Inventors: Paul Filseth, Neal Callan, Kunal Taravade, Mario Garza
  • Publication number: 20040049760
    Abstract: An improved process simulation system for simulating results of fabrication process for a semiconductor device design is disclosed. According to the method and system disclosed herein, the process simulator receives processing parameters and mask data for at least two masks as input, and simulates results of the fabrication process such that an aerial image is generated for each layer of the device that was simulated. After generating the aerial images, the process simulator superimposes the aerial images to create a composite image. An operator is then allowed to misalign at least one of the images in relation to the other images based on one or more offset values. The composite image showing the misalignment is then displayed, allowing the operator to view nominal process capability as well as process fluctuations prior to fabrication of the semiconductor device.
    Type: Application
    Filed: September 5, 2002
    Publication date: March 11, 2004
    Inventors: Mario Garza, Neal Callan, George Bailey, Travis Brist, Paul Filseth
  • Patent number: 5473546
    Abstract: The invention describes a method for expanding (flattening) hierarchical descriptions of electronic circuits into flat descriptions. The method is characterized by two processes: one which eliminates feed-through and implicit signals, and another which pre-plans the layout of the flattened data structure before flattening. The flattening process may then take advantage of a number of resulting efficiencies to operate more quickly than present flatteners.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: December 5, 1995
    Assignee: LSI Logic Corporation
    Inventor: Paul Filseth