Abstract: Methods for modifying preform core ovality during and subsequent to the formation of an optical fiber preform. After MCVD deposition forms the core rod, but prior to overcladding of the core rod, the code rod may be etched to change its ovality. In order to etch the core rod, the core rod may be mounted to lathe, rotated by at least two rotors, and subjected to a heat source. Additionally, one of the at least two rotors may be phase-shifted from another one of the at least two rotors after the core rod is mounted on the lathe.

Abstract: Methods for modifying preform core ovality during and subsequent to the formation of an optical fiber preform. After MCVD deposition forms the core rod, but prior to overcladding of the core rod, the code rod may be etched to change its ovality. In order to etch the core rod, the core rod may be mounted to lathe, rotated by at least two rotors, and subjected to a heat source. Additionally, one of the at least two rotors may be phase-shifted from another one of the at least two rotors after the core rod is mounted on the lathe.

Abstract: Methods for modifying preform core ovality during and subsequent to the formation of an optical fiber preform. Prior to MCVD deposition on a starting tube, the outer diameter of the starting tube is altered by etching or a like process to modify its ovality. Additionally, after MCVD deposition forms the core rod, but prior to overcladding of the core rod, the code rod may be etched to change its ovality. Both methods may be used independently or in combination to modify the ovality and reduce PMD of optical fiber drawn from the core rod. An additional method includes etching the cladding material of a core rod having an oval or elliptical core such that the cladding material mirrors the shape of the oval core. During drawing, the perform created there from is placed under a surface tension, or pulled in a manner to generate a circular or near perfect circular optical fiber having desired ovality and low PMD.

Abstract: Bubble-free core glass can be deposited at relatively high rate (e.g., >0.3 gm SiO.sub.2 /minute, preferably 0.6 gm SiO.sub.2 /minute or more) by MCVD if the deposition conditions are appropriately selected. For instance, a relatively high torch traverse speed, a relatively low sintering temperature, and/or relatively low gas flow rates can facilitate high rate deposition of bubble-free glass. By way of example, conditions are disclosed that yielded essentially bubble-free core glass (.DELTA.=0.35%) at a rate of 1 gm SiO.sub.2 /minute.

Abstract: A large optical preform 303 is made by a modified chemical vapor deposition (MCVD) process by depositing successive layers of core and cladding materials onto the inside surface of a rotating glass tube 33 having a hydroxyl ion (OH.sup.-) level that is less than 0.5 parts per million (ppm) by weight. The tube is then collapsed inwardly to form a core rod 301 in which the deposited core material 31 has a diameter that is greater than about 5 millimeters and the deposited cladding material 32 has an outside diameter that is less than about 15 millimeters. A machine-vision system 140, 150, 160 monitors and controls the diameter of the glass tube by regulating the pressure within the tube. Moreover, the machine-vision system monitors and controls the straightness of the tube by varying its rotational speed according to angular position. After the core rod 301 is formed, it is plasma etched to remove contaminants, and then overclad with two glass jackets 34, 35 having a hydroxyl ion (OH.sup.