Abstract: A method for producing an Al—Cr—O-based coating on a workpiece surface, including: a) placing a workpiece in an interior of a vacuum chamber, and b) depositing a film comprising aluminum and chromium on the workpiece surface to be coated, wherein a ratio of aluminum to chromium in the film in atomic percentage has a first value corresponding to Al/Cr?2.3, and c) forming volatile compounds of Cr—O, thereby causing at least part of the chromium contained in the film to leave the film in a form of Cr—O volatile compounds, and d) executing step c) during a period of time, within which the chromium content in the film is reduced until attaining a second value of the ratio of aluminum to chromium in the film in atomic percentage corresponding to Al/Cr?3.5, thereby the film is transformed into a film containing a reduced content of chromium.

Abstract: The present invention relates to a method for producing a multilayer film comprising aluminum, chromium, oxygen and nitrogen, in a vacuum coating chamber, the multilayer film comprising layers of type A and layers of type B deposited alternate one of each other, wherein during deposition of the multilayer film at least one target comprising aluminum and chromium is operated as cathode by means of a PVD technique and used in this manner as material source for supplying aluminum and chromium, and an oxygen gas flow and a nitrogen gas flow are introduced as reactive gases in the vacuum chamber for reacting with aluminum and chromium, thereby supplying oxygen and nitrogen for forming the multilayer film, characterized in that: —The A layers are deposited as oxynitride layers of Al—Cr—O—N by using nitrogen and oxygen as reactive gas at the same time, —The B layers are deposited as nitride layers of Al—Cr—N by reducing the oxygen gas flow and by increasing the nitrogen gas flow in order to use only nitrogen as reac

Abstract: The present invention relates to coatings comprising or consisting of one or more ternary TM-diboride coating films. The ternary TM-diboride coating films showing exceptionally high phase stability and mechanical properties, even at high temperatures or even after exposition to high temperatures.

Abstract: The present invention relates to coatings comprising or consisting of one or more ternary TM-diboride coating films. The ternary TM-diboride coating films showing exceptionally high phase stability and mechanical properties, even at high temperatures or even after exposition to high temperatures.

Abstract: The present invention relates to a method for producing a multilayer film comprising aluminum, chromium, oxygen and nitrogen, in a vacuum coating chamber, the multilayer film comprising layers of type A and layers of type B deposited alternate one of each other, wherein during deposition of the multilayer film at least one target comprising aluminum and chromium is operated as cathode by means of a PVD technique and used in this manner as material source for supplying aluminum and chromium, and an oxygen gas flow and a nitrogen gas flow are introduced as reactive gases in the vacuum chamber for reacting with aluminum and chromium, thereby supplying oxygen and nitrogen for forming the multilayer film, characterized in that: —The A layers are deposited as oxynitride layers of Al—Cr—O—N by using nitrogen and oxygen as reactive gas at the same time, —The B layers are deposited as nitride layers of Al—Cr—N by reducing the oxygen gas flow and by increasing the nitrogen gas flow in order to use only nitrogen as reac

Abstract: The present invention relates to a method for producing an Al—Cr—O-based coatings comprising at least one Al—Cr—O-based or Al—O-based film on a workpiece surface, wherein the method comprises following steps: a) placing at least one workpiece having a surface to be coated in the interior of a vacuum chamber, and b) depositing a film A comprising aluminum and chromium on the workpiece surface to be coated, wherein the ratio of aluminum to chromium in the film in atomic percentage has a first value corresponding to Al/Cr?2.3 and wherein the method further comprises following steps: c) forming volatile compounds of Cr—O, e.g.

Abstract: The present invention concerns substrates coated with an Mo1-x-ySiXBY layer, said layer comprising the T2 phase, and a method for the production thereof.

Abstract: A hard coating containing at least one layer including chromium, aluminum, tantalum and nitrogen as main components and a chemical composition (AlaCrbTac)N in which the following conditions are satisfied: a=x, (1?c), b=(1?x)·(1?c), 0.60?x?0.70, and 0.01?c?0.5. The layer has an X-ray diffraction peak intensity ratio of I200/(I200+I111)?0.25. The application also relates to a reactive arc ion plating PVD process for making the hard coating.

Abstract: A coating including a multilayer film, which includes a multi-layered structure including layers of the type I and layers of the type II. The layers of the type I are metal nitride with a chemical composition given by the formula Me11-aMe2aZI and the layers of the type II are a Mo-comprising material with chemical composition given by the formula Mo1-b-cSicBbZII or Mo1-b-cSicBb. Also described is a method for depositing the above mentioned coating.

Abstract: A coating including a multilayer film, which includes a multi-layered structure including layers of the type I and layers of the type II. The layers of the type I are metal nitride with a chemical composition given by the formula Me11-aMe2aZI and the layers of the type II are a Mo-comprising material with chemical composition given by the formula Mo1-b-cSicBbZII or Mo1-b-cSicBb. Also described is a method for depositing the above mentioned coating.

Abstract: The present invention relates to a method for coating AI-Cr-0 coatings with the help of a PVD-coating process. The PVD-coating process is performed with the help of Al and Cr comprising targets which are doped with Si. The doping of Si prevents the forming of oxide islands on the target during the reactive coating process.

Abstract: The present invention concerns substrates coated with an Mo1-x-ySixBy layer, said layer comprising the T2 phase, and a method for the production thereof.

Abstract: A hard coating containing at least one layer including chromium, aluminum, tantalum and nitrogen as main components and a chemical composition (AlaCrbTac)N in which the following conditions are satisfied: a=x, (1-c), b=(1-x)·(1-c), 0.60?x?0.70, and 0.01?c?0.5. The layer has an X-ray diffraction peak intensity ratio of 1200/(1200+I111)?0.25. The application also relates to a reactive arc ion plating PVD process for making the hard coating.

Abstract: A wear resistant coating system including a tantalum-containing multilayered film having n A layers and m B layers, where n and m are integral numbers larger than I, deposited alternating one on each other. The multilayered film exhibits crystalline cubic structure, and is characterized in that the B layers include tantalum and the A layers exhibit a higher defect density than the B layers.

Abstract: Arc vaporization of targets produced by means of powder metallurgy in Which the components are in the form of intermetallic compounds. The target is produced using a powder that contains a first and second intermetaallic compound and/or a first and second ceramic compound.

Abstract: A wear resistant coating system including a tantalum-containing multilayered film having n A layers and m B layers, where n and m are integral numbers larger than I, deposited alternating one on each other. The multilayered film exhibits crystalline cubic structure, and is characterized in that the B layers include tantalum and the A layers exhibit a higher defect density than the B layers.

Abstract: The present invention relates to a method for coating AI-Cr-0 coatings with the help of a PVD-coating process. The PVD-coating process is performed with the help of Al and Cr comprising targets which are doped with Si. The doping of Si prevents the forming of oxide islands on the target during the reactive coating process.