Patents by Inventor Paul Hinnen
Paul Hinnen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070176128Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 22, 2006Publication date: August 2, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y Koren, Hoite Theodoor Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Bok Lee, Allan Dunbar
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Publication number: 20060091330Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: May 4, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Johannes Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Koren, Hoite Pieter Tolsma, Hubertus Johannes Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060086910Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 27, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Maria Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y. Koren, Hoite Theodoor Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Bok Lee, Allan Dunbar
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Publication number: 20060081790Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060081791Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060081792Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060012763Abstract: A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.Type: ApplicationFiled: July 13, 2004Publication date: January 19, 2006Inventors: Paul Hinnen, Richard Franciscus Van Haren, Hubertus Gertrudus Simons
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Publication number: 20060012779Abstract: A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.Type: ApplicationFiled: February 4, 2005Publication date: January 19, 2006Applicant: ASML Netherlands B.V.Inventors: Paul Hinnen, Richard Franciscus Van Haren, Hubertus Gertrudus Simons
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Publication number: 20050189502Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: September 22, 2003Publication date: September 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Johannes Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y Koren, Hoite Tolsma, Hubertus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar