Patents by Inventor Paul J. Toscano

Paul J. Toscano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MOCVD precursors based on organometalloid ligands
    Patent number: 6359159
    Abstract: Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: March 19, 2002
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Paul J. Toscano, Rolf Claessen, Andrei Kornilov, Kulbinder Kumar Banger
  • MOCVD precursors based on organometalloid ligands
    Patent number: 6184403
    Abstract: Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: February 6, 2001
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Paul J. Toscano, Rolf Claessen, Andrei Kornilov, Kulbinder Kumar Banger
  • MOCVD processes using precursors based on organometalloid ligands
    Patent number: 6099903
    Abstract: Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: August 8, 2000
    Assignee: Research Foundation of State University of New York
    Inventors: Alain E. Kaloyeros, John T. Welch, Paul J. Toscano, Rolf Claessen, Andrei Kornilov, Kulbinder Kumar Banger