Patents by Inventor Paul Jacques
Paul Jacques has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11977034Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.Type: GrantFiled: March 8, 2021Date of Patent: May 7, 2024Assignee: ASML Netherlands B.V.Inventors: Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Chung-Hsun Li
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Patent number: 11965433Abstract: A turbomachine turbine nozzle extending around a central axis, including at least one radially outer shroud, at least one radially inner shroud, and at least one blade made of ceramic matrix composite material, distinct from the radially inner shroud and from the radially outer shroud, and extending radially between the radially inner shroud and the radially outer shroud, the blade being hollow and including a cavity opening at a radially inner end and at a radially outer end of the blade, the nozzle including at least one tubular mast arranged in the cavity of the blade and allowing routing the ventilation air passing through the cavity of the blade, the mast including a radially outer end attached to the radially outer shroud, and a radially inner end cooperating with a radial flange for positioning the radially inner shroud.Type: GrantFiled: April 28, 2021Date of Patent: April 23, 2024Assignees: SAFRAN AIRCRAFT ENGINES, SAFRAN CERAMICSInventors: Antoine Claude Michel Etienne Danis, Clément Jarrossay, Lucien Henri Jacques Quennehen, Nicolas Paul Tableau, Matthieu Arnaud Gimat
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Publication number: 20240095747Abstract: A system for stable and streamlined transaction approval includes a rule management server and an authorizer server that operates independently of the rule management server. The rule management server is configured to receive a transaction rule associated with an account specified by a client entered through a portal generated by a graphical user interface. The server is further configured to identify data relevant to the transaction rule and transmit the transaction rule and the data identified to an authorizer server. The authorizer server is configured to receive transaction data related to a pending transaction of the credit card and apply the transaction rule to the transaction data and the data identified by the rule management server to determine whether to approve the pending transaction. The authorizer server operates independent of the rule management server and can be optimized to approve transactions quickly and operate in a stable condition.Type: ApplicationFiled: November 28, 2023Publication date: March 21, 2024Inventors: Calvin Jun-Gong Lee, Veeral Dilip Patel, Paul Alexander Meier, Karim Atiyeh, Ariel Petren Langer, Ori Ephraim Goldfield, Geoffrey Jacques Charles
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Patent number: 11922738Abstract: Systems and methods to fuse aviation-related data systems for comprehensive aircraft system health monitoring are provided. One example method includes obtaining, by one or more computing devices, fault data indicative of a plurality of fault indications provided by a first plurality of components of an aircraft. The method includes obtaining, by the one or more computing devices, condition indicators describing the respective operational conditions of a second plurality of components of the aircraft. The method includes fusing, by the one or more computing devices, the fault data with the condition indicators to form a comprehensive data set. The method includes identifying, by the one or more computing devices, one or more causes of the plurality of fault conditions based at least in part on the comprehensive data set. One example system includes a data fuser, a cause identifier, and an alert generator.Type: GrantFiled: January 4, 2017Date of Patent: March 5, 2024Assignee: GE Aviation Systems Taleris LimitedInventors: Maria Louise Watson, Robert William Horabin, Christopher Catt, Frank Beaven, Olivier Paul Jacques Thuong, Thomas Antoine Raymond Bermudez, Aishwarya Coffey
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Publication number: 20230341761Abstract: An anti-reflective article includes a substrate including a surface and a bulk, and an arrangement of anti-reflective nanostructures along the surface of the substrate, each anti-reflective nanostructure of the arrangement of anti-reflective nanostructures being supported by the bulk of the substrate, each anti-reflective nanostructure of the arrangement of anti-reflective nanostructure tapering from the bulk of the substrate to define a respective peak. At least some of the anti-reflective nanostructures of the arrangement of anti-reflective nanostructures are linked with an adjacent anti-reflective nanostructure of the arrangement of anti-reflective nanostructures via a respective interconnection. The respective interconnections are in addition to the bulk of the substrate supporting the anti-reflective nanostructures. The respective interconnections are disposed at or above a midpoint between the peaks of the anti-reflective nanostructures and the bulk of the substrate.Type: ApplicationFiled: October 26, 2021Publication date: October 26, 2023Inventors: Chia-hung Calvin Cheng, Fabien Paul Jacques Dauzou, Siamak Kashi, Nasim Sahraei Khanghah
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Publication number: 20220167572Abstract: The invention relates to a coherent propagation growth substrate product (1) formed of man-made vitreous fibres (MMVF), the product (1) having two opposed top and bottom surfaces and at least one cavity (2) which is open at the top surface and which extends from the top surface towards the bottom surface, wherein a superabsorbent polymer (3) is provided in the cavity (2).Type: ApplicationFiled: February 15, 2022Publication date: June 2, 2022Inventors: Frank Hendrikus Peter JANSSEN, Paul Jacques L.H. BOUWENS, Daan Louis DE KUBBER
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Patent number: 11277982Abstract: The invention relates to a coherent propagation growth substrate product (1) formed of man-made vitreous fibres (MMVF), the product (1) having two opposed top and bottom surfaces and at least one cavity (2) which is open at the top surface and which extends from the top surface towards the bottom surface, wherein a superabsorbent polymer (3) is provided in the cavity (2).Type: GrantFiled: March 7, 2014Date of Patent: March 22, 2022Assignee: ROCKWOOL INTERNATIONAL A/SInventors: Frank Hendrikus Peter Janssen, Paul Jacques L. H. Bouwens, Daan De Kubber
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Publication number: 20210215622Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.Type: ApplicationFiled: March 8, 2021Publication date: July 15, 2021Applicant: ASML Netherlands B.V.Inventors: Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Chung-Hsun Li
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Patent number: 11039584Abstract: A system (10,11) for controlling plant growth conditions in hydroponic growing systems, the system for controlling plant growth conditions comprising: at least one detector (7,1101) for measuring at least one property of a plant growth substrate; first (9,1103) and second (9,12, 1107) data processing means; data storage means (1120); and the or each detector (7,1101) being arranged to measure a property or properties of a plant growth substrate and to transmit a detector identifier and the measured property or properties over a communications link to the first data processing means; the first data processing means (9,1103) being arranged to: hold in a memory predefined irrigation data defining a relationship between: plural values for one or more of temperature, pH level, water content, nutrient content, oxygen content, and plant parameters of the substrate; and plural desired irrigation parameters; process measured properties received from each detector to obtain processed properties of the substrate; providType: GrantFiled: July 3, 2017Date of Patent: June 22, 2021Assignee: ROCKWOOL INTERNATIONAL A/SInventors: Andrew Wreathall Lee, Paul Jacques Louis Hubert Bouwens
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Patent number: 10996176Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.Type: GrantFiled: June 18, 2020Date of Patent: May 4, 2021Assignee: ASML Netherlands B.V.Inventors: Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Chung-Hsun Li
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Publication number: 20200319118Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.Type: ApplicationFiled: June 18, 2020Publication date: October 8, 2020Applicant: ASML Netherlands B.V.Inventors: Wouter Lodewijk ELINGS, Franciscus Bernardus Maria VAN BILSEN, Christianus Gerardus Maria DE MOL, Everhardus Cornelis MOS, Hoite Pieter Theodoor TOLSMA, Peter TEN BERGE, Paul Jacques VAN WIJNEN, Leonard us Henricus Marie VERSTAPPEN, Gerald DICKER, Reiner Maria JUNGBLUT, Chung-Hsun LI
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Patent number: 10746668Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced 2506 defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used 2508 to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked 2510 to at least partially recompose the measurement results according to the sample plan.Type: GrantFiled: April 10, 2019Date of Patent: August 18, 2020Assignee: ASML Netherlands B.V.Inventors: Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Chung-Hsun Li
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Publication number: 20200005674Abstract: This disclosure is of an auscultation training device that includes: a headpiece; at least one earpiece; tubing having a hollow interior, connected between the headpiece and the at least one earpiece, and capable of transmitting sound from the headpiece to the at least one earpiece; a speaker inserted into the hollow interior of the tubing through an insertion point that forms an airtight seal with the tubing, wherein the speaker does not fully obstruct the hollow interior of the tubing; a vent tube having a hollow interior, a first end secured to the tubing such that the tubing hollow interior and vent tube hollow interior are in fluid communication, a second end, and an opening; and a vent solenoid secured to the second end of the vent tube and capable of blocking and unblocking the vent tube opening.Type: ApplicationFiled: August 26, 2019Publication date: January 2, 2020Inventor: Paul Jacques Charles Lecat
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Patent number: 10492388Abstract: A plant growth system is provided, which comprises: one or more plant growth substrates (1); one or more detectors (7) arranged to monitor nutrient levels of at least one of the plant growth substrates; at least one irrigation device (6) arranged to supply water to the plant growth substrates; and control means (9) connected to said detectors and said at least one irrigation device. The supply of water by the at least one irrigation device is controlled by the control means in dependence on the monitored nutrient levels. In this manner, the water and nutrient levels of the substrates can be accurately controlled.Type: GrantFiled: February 7, 2014Date of Patent: December 3, 2019Assignee: ROCKWOOL INTERNATIONAL A/SInventors: Paul Jacques Louis Hubert Bouwens, Eelke Gjalt Hempenius, Jacob Frank De Groot
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Publication number: 20190307087Abstract: A system (10,11) for controlling plant growth conditions in hydroponic growing systems, the system for controlling plant growth conditions comprising: at least one detector (7,1101) for measuring at least one property of a plant growth substrate; first (9,1103) and second (9,12, 1107) data processing means; data storage means (1120); and the or each detector (7,1101) being arranged to measure a property or properties of a plant growth substrate and to transmit a detector identifier and the measured property or properties over a communications link to the first data processing means; the first data processing means (9,1103) being arranged to: hold in a memory predefined irrigation data defining a relationship between: plural values for one or more of temperature, pH level, water content, nutrient content, oxygen content, and plant parameters of the substrate; and plural desired irrigation parameters; process measured properties received from each detector to obtain processed properties of the substrate; providType: ApplicationFiled: July 3, 2017Publication date: October 10, 2019Inventors: Andrew Wreathall LEE, Paul Jacques Louis Hubert BOUWENS
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Publication number: 20190301850Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced 2506 defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used 2508 to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked 2510 to at least partially recompose the measurement results according to the sample plan.Type: ApplicationFiled: April 10, 2019Publication date: October 3, 2019Applicant: ASML Netherlands B.V.Inventors: Wouter Lodewijk ELINGS, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Chung-Hsun Li
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Patent number: 10395557Abstract: Provided is an auscultation training device having a stethoscope with a headpiece; at least one earpiece; tubing, wherein the tubing has a generally hollow interior; a speaker inserted into the hollow interior of the tubing, further having a 3.5 mm audio jack wherein the insertion points of the speaker forms an airtight seal with the tubing, and wherein the speaker does not obstruct the hollow interior of the tubing. Further provided is a method for auscultation training using the disclosed device.Type: GrantFiled: February 10, 2017Date of Patent: August 27, 2019Inventor: Paul Jacques Charles Lecat
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Patent number: 10395558Abstract: Provided is an auscultation training device having a stethoscope with a headpiece; at least one earpiece; tubing, wherein the tubing has a generally hollow interior and an opening in the wall of the tubing; a speaker inserted into the hollow interior of the tubing, further having a 3.5 mm audio jack wherein the insertion points of the speaker forms an airtight seal with the tubing, and wherein the speaker does not obstruct the hollow interior of the tubing. Further provided is a method for auscultation training using the disclosed device.Type: GrantFiled: July 31, 2017Date of Patent: August 27, 2019Inventor: Paul Jacques Charles Lecat
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Patent number: 10317191Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced 2506 defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used 2508 to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked 2510 to at least partially recompose the measurement results according to the sample plan.Type: GrantFiled: February 14, 2017Date of Patent: June 11, 2019Assignee: ASML Netherlands B.V.Inventors: Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge, Paul Jacques Van Wijnen, Leonardus Henricus Marie Verstappen, Gerald Dicker, Reiner Maria Jungblut, Chung-Hsun Li
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Patent number: D1016995Type: GrantFiled: July 15, 2021Date of Patent: March 5, 2024Assignee: AS America, Inc.Inventors: Jean-Jacques L'Henaff, Ki Bok Song, Jacob Nitz, Soonjae Kwon, Paul Flowers, Greg Reinecker