Patents by Inventor Paul John Shechter

Paul John Shechter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190094715
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: November 28, 2018
    Publication date: March 28, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
  • Patent number: 10168624
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: January 1, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20180120715
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: December 28, 2017
    Publication date: May 3, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
  • Patent number: 9857699
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: November 28, 2016
    Date of Patent: January 2, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20170075233
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: November 28, 2016
    Publication date: March 16, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
  • Patent number: 9507270
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: November 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20140362358
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: August 26, 2014
    Publication date: December 11, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John SHECHTER, Paul Alan STOCKMAN
  • Patent number: 8830440
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: September 9, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Patent number: 8164734
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: April 24, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20110273681
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
  • Publication number: 20090201471
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Application
    Filed: December 19, 2008
    Publication date: August 13, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrew John HARPHAM, Paul John Shechter, Paul Alan Stockman
  • Patent number: 7481867
    Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
    Type: Grant
    Filed: June 16, 2004
    Date of Patent: January 27, 2009
    Assignee: Edwards Limited
    Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman