Patents by Inventor Paul K. Chu
Paul K. Chu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120279449Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.Type: ApplicationFiled: February 16, 2012Publication date: November 8, 2012Inventors: Paul K. Chu, Liuhe Li
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Patent number: 8119208Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.Type: GrantFiled: April 18, 2008Date of Patent: February 21, 2012Assignee: City University of Hong KongInventors: Paul K. Chu, Liuhe Li
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Patent number: 7741621Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.Type: GrantFiled: July 14, 2004Date of Patent: June 22, 2010Assignee: City University of Hong KongInventors: Paul K. Chu, Liuhe Li
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Patent number: 7589474Abstract: A closed drift ion source is disclosed. The ion source has an open end 1 and a central axis 150 around which are arranged outer magnetic pole piece 3, inner magnetic pole piece 5, anode 2, shield 6 and back magnetic shunt 17. In one embodiment the anode 2 and inner magnetic pole piece 5 are annular. Permanent magnets 7 are located behind the shield 6 and in contact with outer magnetic pole piece 3 and the back magnetic shunt 17. As a result the magnetic field lines pass through the magnetic pole pieces and a mirror magnetic field is set up in the discharge region between them. The inner magnetic pole piece 5 is hollow which facilitates production of the mirror magnetic field.Type: GrantFiled: December 6, 2006Date of Patent: September 15, 2009Assignee: City University of Hong KongInventors: Paul K. Chu, Deli Tang, Shihao Pu, Honghui Tong, Qingchuan Chen
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Publication number: 20080193666Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.Type: ApplicationFiled: April 18, 2008Publication date: August 14, 2008Applicant: CITY UNIVERSITY OF HONG KONGInventors: Paul K. CHU, Liuhe LI
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Publication number: 20080136309Abstract: A closed drift ion source is disclosed. The ion source has an open end 1 and a central axis 150 around which are arranged outer magnetic pole piece 3, inner magnetic pole piece 5, anode 2, shield 6 and back magnetic shunt 17. In one embodiment the anode 2 and inner magnetic pole piece 5 are annular. Permanent magnets 7 are located behind the shield 6 and in contact with outer magnetic pole piece 3 and the back magnetic shunt 17. As a result the magnetic field lines pass through the magnetic pole pieces and a mirror magnetic field is set up in the discharge region between them. The inner magnetic pole piece 5 is hollow which facilitates production of the mirror magnetic field.Type: ApplicationFiled: December 6, 2006Publication date: June 12, 2008Inventors: Paul K. Chu, Deli Tang, Shihao Pu, Honghui Tong, Qingchuan Chen
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Patent number: 6740843Abstract: An apparatus and method are disclosed whereby if the arc in a DC or long-pulse AC vacuum arc plasma process (eg in vacuum deposition) starts to extinguish, this is automatically detected and a re-ignition process is activated. Detection of a tendency for the arc to extinguish is detected by monitoring the main power supply voltage, which will increase if the arc is extinguished.Type: GrantFiled: September 12, 2002Date of Patent: May 25, 2004Assignee: City University of Hong KongInventors: Paul K. Chu, Liuhe Li
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Publication number: 20030226827Abstract: An apparatus and method are disclosed whereby if the arc in a DC or long-pulse AC vacuum arc plasma process (eg in vacuum deposition) starts to extinguish, this is automatically detected and a re-ignition process is activated. Detection of a tendency for the arc to extinguish is detected by monitoring the main power supply voltage, which will increase if the arc is extinguished.Type: ApplicationFiled: September 12, 2002Publication date: December 11, 2003Applicant: City University of Hong KongInventors: Paul K. Chu, Liuhe Li
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Publication number: 20030116090Abstract: An apparatus and method are disclosed for a low-pressure steady-state direct current or long-pulse mode of plasma immersion ion implantation. A conducting grid is located between the wafer stage and the supply of plasma. The supply of plasma may be controlled through a variable aperture in which is provided the conducting grid.Type: ApplicationFiled: February 13, 2003Publication date: June 26, 2003Applicant: City University of Hong KongInventors: Paul K. Chu, Dixon T.K. Kwok, Xuchu Zeng
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Publication number: 20010046566Abstract: An apparatus and method are disclosed for a low-pressure steady-state direct current or long-pulse mode of plasma immersion ion implantation. A conducting grid is located between the wafer stage and the supply of plasma. The supply of plasma may be controlled through a variable aperture in which is provided the conducting grid.Type: ApplicationFiled: March 23, 2001Publication date: November 29, 2001Inventors: Paul K. Chu, Dixon T.K. Kwok, Xuchu Zeng
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Patent number: 6269765Abstract: A plasma treatment system (200) for implantation with a novel susceptor with a perforated shield (201) and collection devices (221). The system (200) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate, which has a surface. The perforated shield (201) draws ions from the implantation toward and through the shield to improve implant uniformity in the substrate. The collection device accumulates charge that can detrimentally influence the substrate during processing. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.Type: GrantFiled: October 1, 1998Date of Patent: August 7, 2001Assignee: Silicon Genesis CorporationInventors: Paul K. Chu, Chung Chan
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Patent number: 6228176Abstract: A plasma treatment system (200) for implantation with a novel susceptor with a cotoured underlying surface (201). The system (200) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate, which has a surface. The contoured underlying surface deflects impinging ions in a direction away from the substrate surface, thereby reducing a possibility of particulate contamination on the substrate. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.Type: GrantFiled: June 3, 1998Date of Patent: May 8, 2001Assignee: Silicon Genesis CorporationInventors: Paul K. Chu, Chung Chan
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Patent number: 6217724Abstract: A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces non-silicon impurities that may attach to the silicon substrate. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.Type: GrantFiled: December 18, 1998Date of Patent: April 17, 2001Assignee: Silicon General CorporationInventors: Paul K. Chu, Chung Chan
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Patent number: 6186091Abstract: A plasma treatment system (200) for implantation with a novel susceptor with shielding (203). The system (200) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a substrate. A shield (203) is disposed adjacent to the susceptor for blocking impurities that may possibly be introduced from a backside of the susceptor. The shield allows fewer impurities to be sputtered from the backside of the susceptor. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.Type: GrantFiled: October 2, 1998Date of Patent: February 13, 2001Assignee: Silicon Genesis CorporationInventors: Paul K. Chu, Chung Chan
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Patent number: 6120660Abstract: A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces non-silicon impurities that may attach to the silicon substrate. The system (200) also includes a silicon liner, which is used to line inner portions of the chamber walls.Type: GrantFiled: December 18, 1998Date of Patent: September 19, 2000Assignee: Silicon Genesis CorporationInventors: Paul K. Chu, Chung Chan
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Patent number: 6113735Abstract: A plasma immersion implantation system (100), including a network for controlling the system. The network communicates to the system by way of packets, which are used to pass signals to and from one of a plurality of controllers. The controllers are used to oversee one of a plurality of processing parameters or field processes such as rf voltage, pressure, etc.Type: GrantFiled: March 1, 1999Date of Patent: September 5, 2000Assignee: Silicon Genesis CorporationInventors: Paul K. Chu, A. G. Liu
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Patent number: 6051073Abstract: A plasma treatment system (200) for implantation with a novel susceptor with a perforated shield (201). The system (200) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate, which has a surface. The perforated shield (201) draws ions from the implantation toward and through the shield to improve implant uniformity in the substrate. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.Type: GrantFiled: June 3, 1998Date of Patent: April 18, 2000Assignee: Silicon Genesis CorporationInventors: Paul K. Chu, Chung Chan